Exploring the Mechanism for the Synthesis of Silsesquioxanes.4.The Synthesis of T_8

Takako Kudo; Kazuya Machida; Mark S.Gordon

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Exploring the Mechanism for the Synthesis of Silsesquioxanes.4.The Synthesis of T_8

机译：探索倍半硅氧烷的合成机理。4。T_8的合成

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In an attempt to explore the mechanism for the synthesis of silsesquioxanes(POSS),the entire reaction processes from HSi(OH)_3 to T_8,one of the most common and stable POSS was investigated with electronic structure theory calculations,including electron correlation effects.In addition,the effect of some controlling factors,which play important roles in the reaction mechanism,is discussed.

机译：为了探索硅倍半氧烷（POSS）的合成机理，通过电子结构理论计算，包括电子相关效应，研究了从HSi（OH）_3到T_8的整个反应过程，这是最常见，最稳定的POSS之一。此外，还讨论了在反应机理中起重要作用的一些控制因素的作用。

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《The journal of physical chemistry, A. Molecules, spectroscopy, kinetics, environment, & general theory》 |2005年第24期|共6页
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Takako Kudo; Kazuya Machida; Mark S.Gordon;
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机译：探索倍半硅氧烷的合成机理。4。T_8的合成
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7. Exploring the Mechanism for the Synthesis of Silsesquioxanes. 4. The Synthesis of T8 [O] . Kudo, Takako, Machida, Kazuya, Gordon, Mark S. 2005

机译：探索倍半硅氧烷的合成机理。 4. T8的合成

Exploring the Mechanism for the Synthesis of Silsesquioxanes.4.The Synthesis of T_8

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