...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>The journal of physical chemistry, A. Molecules, spectroscopy, kinetics, environment, & general theory >Formation and decay of fluorobenzene radical anions affected by their isomeric structures and the number of fluorine atoms
【24h】

Formation and decay of fluorobenzene radical anions affected by their isomeric structures and the number of fluorine atoms

机译：氟苯自由基阴离子的形成和衰变受其异构结构和氟原子数的影响

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Aryl fluoride has attracted much attention as a resist component for extreme ultraviolet (EUV) lithography, because of the high absorption cross section of fluorine for EUV photons; however, less is known about electron attachment to fluorobenzene (FBz) and the stability of the reduced state. Picosecond and nanosecond pulse radiolysis of tetrahydrofuran solutions of FBz from mono-, di-, tri-, tetra-, penta-, and hexafluorobenzene was performed, and the effects of isomeric structure and number of fluorine atoms were examined. Scavenging of solvated electrons was found to correlate with the electron affinity obtained by density functional theory in the gas phase, whereas the decay of FBz radical anions was dominated by the activation energy of fluorine anion dissociation calculated using a polarized continuum model (PCM). A sharp contrast in the lifetimes of ortho-, meta-, and para-position difluorobenzene was observed, which could provide information on the molecular design of functional materials.
机译：氟化芳基作为极紫外（EUV）光刻的抗蚀剂成分已经引起了广泛的关注，这是因为EUV光子的氟具有高吸收截面。然而，人们对电子与氟苯的附着以及还原态的稳定性知之甚少。进行了单，二，三，四，五和六氟苯对FBz的四氢呋喃溶液的皮秒和纳秒脉冲辐射解，并研究了异构结构和氟原子数的影响。发现在气相中溶剂化电子的清除与通过密度泛函理论获得的电子亲和力相关，而FBz自由基阴离子的衰变主要是由极化连续谱模型（PCM）计算得出的氟阴离子解离的活化能。观察到邻位，间位和对位二氟苯的寿命形成鲜明对比，这可以为功能材料的分子设计提供信息。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号