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Oxidative reactions of silicon atoms and clusters at ultralow temperature in helium droplets

机译:氦液滴中超低温下硅原子和团簇的氧化反应

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The reaction between Si and O2 was studied in liquid He droplets at low temperature (T = 0.37 K) by monitoring the energy release during the reaction. Additionally, the reactions of Si atoms and clusters with the oxidation agents H2O and O2 have been studied by mass spectrometry. It was found that Si atoms react fast with O2 molecules. On the other hand, Si atoms and clusters do not react with H 2O molecules. The energy released during the chemical reaction leads to the ejection of the products from small He droplets. In contrast, large He droplets (NHe > 20000) are capable of keeping part of the reaction products in their interior. The observation of SiO2 products with the mass spectrometer reveals that the He droplet can stabilize intermediate products in the exit channel.
机译:通过监测反应过程中的能量释放,在低温(T = 0.37 K)的He液滴中研究了Si和O2之间的反应。另外,通过质谱研究了Si原子和团簇与氧化剂H 2 O和O 2的反应。发现Si原子与O 2分子快速反应。另一方面,Si原子和簇不与H 2 O分子反应。化学反应过程中释放的能量导致产物从He小液滴中喷出。相反,大的He液滴(NHe> 20000)能够将部分反应产物保留在其内部。用质谱仪观察SiO2产物表明,He液滴可以稳定出口通道中的中间产物。

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