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首页> 外文期刊>The journal of physical chemistry, A. Molecules, spectroscopy, kinetics, environment, & general theory >Advanced nanocluster ion source based on high-power impulse magnetron sputtering and time-resolved measurements of nanocluster formation
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Advanced nanocluster ion source based on high-power impulse magnetron sputtering and time-resolved measurements of nanocluster formation

机译：基于大功率脉冲磁控溅射和纳米簇形成的时间分辨测量的先进纳米簇离子源

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摘要

We developed a new nanocluster (NC) ion source based on the high-power impulse magnetron sputtering (HiPIMS) technique coupled with a gas flow cell reactor. Silver NC anions (Ag_n ~-) with a maximum intensity of 5.5 nA (Ag_(11) ~-) are generated with the size ranging from the atomic anion to the 70-mer, which is well-controlled by simply adjusting the peak power and repetition rate of the HiPIMS. By time-resolved density profiles of Ag_n ~-, we find that the ion beam generated by HiPIMS is characterized by individual 100 ms duration "bunches" below a repetition rate of 10 Hz, which is well-Thermalized with a group velocity of 5 m/s. The high intensity of the NCs is attributable to the high ionization fraction by this HiPIMS ion source, while the underlying mechanism of the flexible size tuning of the ion source is understood by time-resolved mass spectrometry coupled with the sequential growth mechanism; the increment of the density of the target species in the bunches with the peak power and the overlapping of the bunches with the repetition rate cause the formation of large NCs.
机译：我们基于高功率脉冲磁控溅射（HiPIMS）技术和气流池反应器，开发了一种新的纳米簇（NC）离子源。产生最大强度为5.5 nA的银NC阴离子（Ag_n〜-）（Ag_（11）〜-），其大小范围从原子阴离子到70-mer，可以通过简单地调节峰值功率来很好地控制它和HiPIMS的重复率。通过时间分辨的Ag_n〜-的密度分布，我们发现HiPIMS产生的离子束的特征是在10 Hz重复频率以下的各个100 ms持续时间“束”，并以5 m的群速度很好地热化了/ s。 NC的高强度归因于此HiPIMS离子源的高电离率，而离子源的灵活尺寸调节的基本机理是通过时间分辨质谱法和顺序生长机理来理解的。束中目标物种的密度随峰值功率的增加以及束与重复率的重叠导致形成大的NC。

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