Electrochemical Behavior of Poly(ferrocenyldimethylsilane-b-dimethylsiloxane) Films

Tao Chen; Li Wang; Guohua Jiang; Jianjun Wang; Xiaochen Dong; Xuejie Wang; Junfeng Zhou; Chiliang Wang; Wei Wang

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Electrochemical Behavior of Poly(ferrocenyldimethylsilane-b-dimethylsiloxane) Films

机译：聚二茂铁基二甲基硅烷-b-二甲基硅氧烷薄膜的电化学行为

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The electrochemical behavior of poly(ferrocenyldimethylsilane-b-dimethylsiloxane) (PFDMS-b-PDMS) films deposited on a glassy carbon electrode was investigated by means of cyclic voltammetry (CV).The influences of the solvent,film thickness,temperature,and PDMS block length in PFDMS-b-PDMS on the electrode process were discussed.It was found that in 0.1 M aqueous LiClO_4 the electrochemical processes of the films on a glassy carbon electrode were complex and have a low rate of electron transport and mass diffusion.The kinetic parameters obtained indicated that the electrode process was controlled by both the electrode reaction and mass diffusion.

机译：通过循环伏安法（CV）研究了沉积在玻璃碳电极上的聚二茂铁基二甲基硅烷-b-二甲基硅氧烷（PFDMS-b-PDMS）膜的电化学行为。溶剂，膜厚，温度和PDMS的影响讨论了PFDMS-b-PDMS在电极上的嵌段长度。发现在0.1 M的LiClO_4水溶液中，玻碳电极上的膜的电化学过程很复杂，并且电子传输和质量扩散率低。所获得的动力学参数表明电极过程受电极反应和质量扩散的控制。

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《The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical》 |2005年第10期|共7页
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Tao Chen; Li Wang; Guohua Jiang; Jianjun Wang; Xiaochen Dong; Xuejie Wang; Junfeng Zhou; Chiliang Wang; Wei Wang;
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1. Electrochemical Behavior of Poly(ferrocenyldimethylsilane-b-dimethylsiloxane) Films [J] . Tao Chen, Li Wang, Guohua Jiang, The journal of physical chemistry, B. Condensed matter, materials, surfaces, interfaces & biophysical . 2005,第10期

机译：聚二茂铁基二甲基硅烷-b-二甲基硅氧烷薄膜的电化学行为
2. Electrochemical behavior on poly(ferrocenyldimethylsilane)b-poly(benzyl ether) linear-dendritic organometallic polymer films [J] . Chen T, Wang L, Jiang GH, Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry . 2006,第1期

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Electrochemical Behavior of Poly(ferrocenyldimethylsilane-b-dimethylsiloxane) Films

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