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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >ZnO Morphology Control by Pulsed Electrodeposition
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ZnO Morphology Control by Pulsed Electrodeposition

机译：脉冲电沉积控制ZnO的形貌

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摘要

ZnO films have been grown by pulsed electrochemical deposition between a reduction potential and an oxidation potential to improve their quality. Different morphologies like columns, platelets, flowers, and high-quality planar films are obtained changing the reduction potential without further addition of additives. The mechanism behind this control in morphology is ascribed to the OH~ concentration at the electrode surface (pH) as a consequence of the reduction potential. The morphology, surface potential, and electrical conduction mechanism of high-quality ZnO films were simultaneously measured by kelvin probe force microscopy (KPFM). As a result of these measurements, one can conclude that the ZnO surface perpendicular to the [0001] direction is positively charged. Also, it becomes evident that the surface potential drop is mainly produced at the grain boundaries for the ZnO films grown by pulsing between —0.5 and 0.9 V, which indicates intergrain contact resistance.
机译：ZnO薄膜通过在还原电势和氧化电势之间进行脉冲电化学沉积来生长，以提高其质量。在不进一步添加添加剂的情况下，就可以改变还原电位，从而获得不同的形态，例如圆柱，血小板，花朵和高质量的平面膜。这种形态控制背后的机制归因于还原电位的作用，导致电极表面（pH）的OH〜浓度升高。用开尔文探针力显微镜（KPFM）同时测量了高质量ZnO薄膜的形貌，表面电势和导电机理。这些测量的结果是，可以得出结论，垂直于[0001]方向的ZnO表面带正电。同样，很明显，表面电势下降主要发生在通过在-0.5至0.9 V之间脉冲产生的ZnO薄膜的晶界处，这表明晶间接触电阻。

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