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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Electrochemical Doping of Compact TiO2 Thin Layers
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Electrochemical Doping of Compact TiO2 Thin Layers

机译:致密TiO2薄层的电化学掺杂

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摘要

Electrochemical n-doping of dense thin films of TiO2 (anatase) occurs upon proton insertion from acidic aqueous electrolyte solution. Details of the reaction are investigated by cyclic voltammetry and by electrochemical impedance spectroscopy. The good-quality films are ideally compact, mimicking the properties of a macroscopic single-crystal electrode. The n-doping is stable for at least weeks of electrode storage in air at room temperature. Doping manifests itself by characteristic morphological differences of the surface. Electrochemical Li~+ insertion indicates that there is a competition between Li~+ and H~+ ions in the lattice, detectable by cyclic voltammetry.
机译:质子从酸性电解质水溶液中插入后,会发生TiO2密集薄膜(锐钛矿)的电化学n掺杂。通过循环伏安法和电化学阻抗谱研究反应的细节。高质量的薄膜理想地致密,模仿了宏观单晶电极的特性。在室温下,n掺杂在空气中至少可稳定存放数周。掺杂通过表面的特征形态差异表现出来。电化学Li〜+的插入表明晶格中的Li〜+和H〜+离子之间存在竞争,可以通过循环伏安法检测到。

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