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Value Added Nano-finishing Cotton Textile using Water-free Plasma Technology

机译:使用无水等离子技术的增值纳米整理棉纺织品

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Wet chemical processing of textiles is important to remove the impurities from the fibre surface and to make accessible for dyeing and value added finishing, besides improvement in aesthetic and functional value. However, the process is water, energy,and chemical intensive due to the liquid based multi-step operations. In this study, cotton textile was plasma treated in an indigenously developed atmospheric pressure plasma reactor in presence of Helium (He), helium-oxygen (He-02), helium-fluorocarbon (He-FC) gases for improvement in hydrophilic and hydrophobic functionalities without using water as a processing medium. Optical emission spectrum (OES) showed the fragmentation of fluorocarbon with atomic lines of F at 429 nm, 357 nm, 341 nm, 325 nm,and -CF2 at 318 nm. After the plasma treatment, hydrophilic cotton turned into highly hydrophobic one. As a result of this, a water droplet of 37u.l did not get absorbed by the fabric even after 60 min, whereas in the untreated sample it got absorbed within 3 s. ATR-FTIR showed the presence of various -CFx molecule in the plasma treated sample. Electron spin resonance (ESR) analysis indicated formation of more free radicals on cotton textile in the He plasma treated sample. Secondary ion mass spectrometry (SIMS) analysis showed strong molecular peak of F" at 19 amu in addition to significant decrease of O" and OH molecular peaks at 16 and 17 amu, respectively in the plasma treated sample. SIMS molecular image confirmed that there was no blockage of inter-fibre spacing in the plasma treated sample.
机译:纺织品的湿法化学加工对于改善纤维表面的杂质,使其易于染色和增值整理非常重要,除了改善美学和功能价值。但是,由于基于液体的多步操作,该过程需要大量的水,能源和化学物质。在这项研究中,棉纺织物在本地开发的大气压等离子体反应器中进行了等离子体处理,该反应器中存在氦(He),氦氧(He-02),氦碳氟化合物(He-FC)气体,以改善亲水和疏水功能不使用水作为处理介质。发射光谱(OES)显示碳原子在429 nm,357 nm,341 nm,325 nm和-CF2在318 nm处的F原子碎裂。等离子处理后,亲水棉变成高度疏水的棉。结果,即使在60分钟后,37u.l的水滴也没有被织物吸收,而在未经处理的样品中,它在3 s内就被吸收了。 ATR-FTIR显示在血浆处理过的样品中存在各种-CFx分子。电子自旋共振(ESR)分析表明,在经过He等离子体处理的样品中,棉织物上会形成更多的自由基。二次离子质谱法(SIMS)分析显示,在经过等离子体处理的样品中,分别在16和17 amu处的O“和OH分子峰分别显着降低,并且在19 amu处具有较强的F”分子峰。 SIMS分子图像证实在等离子体处理的样品中没有纤维间间距的阻塞。

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