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A gigawatt power pulsed ion beam generator for industrial applications

机译:千兆瓦功率脉冲离子束发生器,用于工业应用

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摘要

The results of a comprehensive study of a gigawatt level power pulsed ion beam used for material modification are presented. The ion beam is formed using a diode with self-magnetic insulation. The study was performed using the TEMP-4M accelerator in double pulse formation mode. The ion current density is 30-300A/cm~2 (for different designs of diodes), and the beam is composed of protons (15%) and carbon ions (85%). It was shown that a diode with planar configuration generates an ion beam with a fairly homogeneous energy density over a cross section of 80cm~2; the energy density is 0.3-0.4J/cm~2 and the fluence is 2×10~(13)cm~(-2) per pulse. A diode with focusing geometry forms an ion beam with an energy density of 2-2.5J/cm~2 at the focus and a pulse energy of 80-100J.
机译:提出了用于材​​料改性的千兆瓦级功率脉冲离子束的综合研究结果。使用具有自磁绝缘的二极管形成离子束。该研究是在双脉冲形成模式下使用TEMP-4M加速器进行的。离子电流密度为30-300A / cm〜2(用于不同设计的二极管),并且束流由质子(15%)和碳离子(85%)组成。结果表明,平面结构的二极管产生的离子束在80cm〜2的横截面上具有相当均匀的能量密度。每脉冲能量密度为0.3-0.4J / cm〜2,能量密度为2×10〜(13)cm〜(-2)。具有聚焦几何形状的二极管在聚焦处形成能量密度为2-2.5J / cm〜2的离子束,脉冲能量为80-100J。

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