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首页> 外文期刊>Dalton transactions: An international journal of inorganic chemistry >Aerosol-assisted delivery of precursors for chemical vapour deposition: Expanding the scope of CVD for materials fabrication
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Aerosol-assisted delivery of precursors for chemical vapour deposition: Expanding the scope of CVD for materials fabrication

机译：气溶胶辅助的化学气相沉积前驱物：扩大了CVD在材料制造中的范围

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摘要

The production of thin films of materials has become the attention of a great deal of research throughout academia and industry worldwide owing to the array of applications which utilise them, including electronic devices, gas sensors, solar cells, window coatings and catalytic systems. Whilst a number of deposition techniques are in common use, chemical vapour deposition (CVD) is an attractive process for the production of a wide range of materials due to the control it offers over film composition, coverage and uniformity, even on large scales. Conventional CVD processes can be limited, however, by the need for suitably volatile precursors. Aerosol-assisted (AA)CVD is a solution-based process which relies on the solubility of the precursor, rather than its volatility and thus vastly extends the range of potentially applicable precursors. In addition, AACVD offers extra means to control film morphology and concurrently the properties of the deposited materials. In this perspective we discuss the AACVD process, the influence of deposition conditions on film characteristics and a number of materials and applications to which AACVD has been found beneficial.
机译：由于薄膜材料的应用领域广泛，包括电子设备，气体传感器，太阳能电池，车窗涂料和催化系统，薄膜材料的生产已成为全世界学术界和工业界研究的重点。尽管许多沉积技术是普遍使用的，但是化学气相沉积（CVD）由于可控制膜的成分，覆盖范围和均匀性，即使在大规模生产中，也可用于生产多种材料，是一种有吸引力的工艺。然而，由于需要适当挥发性的前体，常规的CVD工艺可能受到限制。气溶胶辅助（AA）CVD是一种基于溶液的方法，该方法依赖于前体的溶解度而不是挥发性，因此极大地扩展了可能适用的前体的范围。另外，AACVD提供了额外的手段来控制薄膜的形貌，并同时控制沉积材料的特性。从这个角度出发，我们讨论了AACVD工艺，沉积条件对薄膜特性的影响以及发现AACVD有益的许多材料和应用。

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