• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Journal of Applied Polymer Science >Formation of nanoporous poly(methyl silsesquioxane) thin films using adamantane for low-k application
【24h】

Formation of nanoporous poly(methyl silsesquioxane) thin films using adamantane for low-k application

机译：利用金刚烷在低k应用中形成纳米多孔聚（甲基倍半硅氧烷）薄膜

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Nanoporous poly(methyl silsesquioxane) PMSSQ thin films for low-k application have been prepared using chemically attached adamantylphenols as pore generating materials (porogen). To obtain the mechanically stable porous structure, multifunctional 1,2-bistrimethoxysilylethane (BTMSE) was employed in addition to methyltrimethoxysilane as a main matrix material. From the decomposition of porogen, confirmed by FTIR and TGA, the nanoporous thin films containing pores less than 5 nm, which are characterized using sorption analysis, were successfully achieved. The dielectric constant was significantly decreased to 1.9, while maintaining the stable mechanical properties with the elastic modulus of 3.7 GPa measured by a nanoindenter. (c) 2007 Wiley Periodicals, Inc.
机译：使用化学连接的金刚烷基苯酚作为成孔材料（成孔剂），制备了用于低k应用的纳米多孔聚（甲基倍半硅氧烷）PMSSQ薄膜。为了获得机械稳定的多孔结构，除使用甲基三甲氧基硅烷作为主要基质材料外，还使用了多功能1,2-双三甲氧基硅烷基乙烷（BTMSE）。通过FTIR和TGA证实的致孔剂的分解，成功地获得了用吸附分析法表征的孔小于5nm的纳米多孔薄膜。介电常数显着降低至1.9，同时通过纳米压头测得的弹性模量为3.7 GPa，保持了稳定的机械性能。 （c）2007年Wiley Periodicals，Inc.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号