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首页> 外文期刊>Journal of Applied Polymer Science >Oxygen Barrier Coating Deposited by Novel Plasma-enhanced Chemical Vapor Deposition
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Oxygen Barrier Coating Deposited by Novel Plasma-enhanced Chemical Vapor Deposition

机译：新型等离子体增强化学气相沉积法沉积的阻氧涂层

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We report the use of a novel plasma-enhanced chemical vapor deposition chamber with coaxial electrode geometry for the SiOx deposition. This novel plasma setup exploits the diffusion of electrons through the inner most electrode to the interior samples space as the major energy source. This configuration enables a gentle treatment of sensitive materials like low-density polyethylene foils and biodegradable materials. SiOx coatings deposited in the novel setup were compared with other state of the art plasma coatings and were found to possess equally good or better barrier properties. The barrier effect of single-layer coatings deposited under different reaction conditions was studied. The coating thickness and the carbon content in the coatings were found to be the critical parameters for the barrier property. The novel barrier coating was applied on different polymeric materials, and it increased the barrier property of the modified low-density polyethylene, polyethylene terephthalate, and polylactide by 96.48%, 99.69%, and 99.25%, respectively.
机译：我们报告使用新颖的等离子体增强化学气相沉积室与同轴电极几何形状的SiOx沉积。这种新颖的等离子装置利用电子通过最内层电极扩散到内部样品空间作为主要能源。这种配置可以轻柔地处理敏感材料，例如低密度聚乙烯箔和可生物降解的材料。将以新颖装置沉积的SiOx涂层与其他现有技术的等离子涂层进行了比较，发现它们具有同等或更好的阻隔性能。研究了在不同反应条件下沉积的单层涂层的阻挡作用。发现涂层的厚度和涂层中的碳含量是阻挡性能的关键参数。将该新型阻隔涂料涂覆在不同的聚合物材料上，可将改性低密度聚乙烯，聚对苯二甲酸乙二醇酯和聚丙交酯的阻隔性能分别提高96.48％，99.69％和99.25％。

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