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首页> 外文期刊>Journal of Applied Polymer Science >Preparation of Highly Uniform Self-Standing Submicrometer Polyimide Films and an Investigation of Their Antibulging Capabilities
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Preparation of Highly Uniform Self-Standing Submicrometer Polyimide Films and an Investigation of Their Antibulging Capabilities

机译：高度均一的自立式亚微米级聚酰亚胺薄膜的制备及其抗膨胀性能的研究

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摘要

Aiming for X-ray astronomy applications, we prepared large-area submicrometer polyimide (PI) films [diameter (Ф)=8 cm] with great thickness uniformity via the spin-coating technique by using a PI precursor, poly(amic acid) (PAA) derived from 3,30,4,40-biphenyltetracarboxylic dianhydride, and p-phenylenediamine as the starting materials. The effects of the spinning speed, apparent viscosity of the PAA solution (η), and spinning time on the PI film thickness and its uniformity, as characterized by the measurement of the film thickness every 0.5 cm along the diameter direction, were investigated. By optimizing the spin-coating conditions, we prepared final submicrometer PI films with average thicknesses in the range of 200-850 nm and with film thickness fluctuations of less than 1.3%. The pressure bulge test results indicate that at a thickness of 805 nm and an inside test aperture diameter of 2.64 cm, the prepared PI films reached a final burst pressure of 20.2 KPa; this suggested excellent mechanical performances in the self-standing submicrometer PI film. This study makes a contribution by providing a typical example and opening the way for the preparation of robust self-standing submicrometer PI films with great thickness uniformities for X-ray astronomy applications.
机译：针对X射线天文学的应用，我们通过使用PI前驱体聚酸（酰胺酸）的旋涂技术制备了厚度均匀性高的大面积亚微米级聚酰亚胺（PI）膜[直径（Ф）= 8 cm]（衍生自3,30,4,40-联苯四甲酸二酐和对苯二胺为原料。研究了纺丝速度，PAA溶液的表观粘度（η）和纺丝时间对PI膜厚度及其均匀性的影响，其特征是沿直径方向每0.5 cm测量一次膜厚度。通过优化旋涂条件，我们制备了平均厚度在200-850 nm之间且膜厚波动小于1.3％的最终亚微米PI膜。压力凸起测试结果表明，在厚度为805 nm，内部测试孔径为2.64 cm的情况下，制备的PI膜的最终破裂压力为20.2 KPa。这表明自立式亚微米PI膜具有出色的机械性能。这项研究通过提供一个典型的例子并为制备坚固的自立式亚微米PI膜（为X射线天文学应用提供了很大的厚度均匀性）开辟了道路，做出了贡献。

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