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首页> 外文期刊>Journal of Applied Polymer Science >Spontaneous formation of discrete arrangement of particles by dipping ultraviolet/ozone-treated poly(dimethylsiloxane) substrate in solution
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Spontaneous formation of discrete arrangement of particles by dipping ultraviolet/ozone-treated poly(dimethylsiloxane) substrate in solution

机译：通过将紫外线/臭氧处理的聚（二甲基硅氧烷）底物浸入溶液中，自发形成颗粒的离散排列

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摘要

The spontaneous formation of well-ordered microstructures is an interesting research topic because such formation is useful for cost-effective production of functional materials. In this article, we report a novel method for spontaneous formation of a discrete arrangement of particles using an ultraviolet/ozone-treated poly(dimethylsiloxane) substrate. The substrate was first dipped in a solution (solvent: mixture of methanol and water, solute: sucrose or lithium perchlorate) in a sealed vessel filled with the vapor of the solvent, and was then dried in air to precipitate the solute as particles. In spite of the simplicity of the procedure, the particles were regularly and discretely arranged in a triangular lattice with a distance between the neighboring particles of about 48 mu m. The mechanism of formation of the array was explained by considering the formation of regular dimples due to swelling of the substrate surface with the solution and the dewetting of the liquid film of the solution on the surface. (c) 2016 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2016, 133, 43506.
机译：自发形成有序的微结构是一个有趣的研究课题，因为这种形成对于功能材料的经济有效生产很有用。在本文中，我们报告了一种使用紫外线/臭氧处理的聚（二甲基硅氧烷）基材自发形成颗粒离散排列的新方法。首先将基板浸入装有溶剂蒸汽的密封容器中的溶液（溶剂：甲醇和水的混合物，溶质：蔗糖或高氯酸锂）中，然后在空气中干燥以沉淀溶质，形成颗粒。尽管该过程简单，但仍将颗粒规则且离散地排列成三角形格子，相邻颗粒之间的距离约为48μm。通过考虑由于溶液使衬底表面溶胀和表面上溶液的液膜反润湿而形成规则的凹坑，来解释阵列的形成机理。 （c）2016 Wiley Periodicals，Inc. J. Appl。 Polym。科学2016，133，43506。

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