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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Epitaxial growth and superhardness effect of TiN/AlON nanomultiiayers synthesized by reactive magnetron sputtering technology
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Epitaxial growth and superhardness effect of TiN/AlON nanomultiiayers synthesized by reactive magnetron sputtering technology

机译：反应磁控溅射技术合成的TiN / AlON纳米复合材料的外延生长和超硬效应

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摘要

Ti and Al_2O_3 targets were used to synthesize a series of TiN/AlON nanomultiiayers in the gas mixture of Ar and N_2 through reactive magnetron sputtering technology. The formation of AlON and the effect of AlON thickness on microstructures and mechanical properties of the multilayers were evaluated by means of energy dispersive spectrometry, X-ray diffractometry, high-resolution field transmission electron microscopy and nandindentation. The results revealed that AlON was formed when Al_2O_3 target was sputtered in the gas mixture of Ar and N_2 resulting from 0 atoms in Al_2O_3 being partially replaced by N atoms. Under normal deposition conditions, AlON was amorphous. However, as a component of nanomultiiayers, AlON, when thickness being less than 0.6 nm, was forced to crystallize and grew epitaxially on TiN due to the template effect, and the resultant nanomultilayer yielded superhardness effect with a maximum hardness value of 40.5 GPa. When AlON's thickness was increased up to 0.6 nm, its growth mode returned from crystalline back to amorphous, and the epitaxial structure was destroyed, resulting in the disappearance of superhardness effect.
机译：通过反应磁控溅射技术，利用Ti和Al_2O_3靶在Ar和N_2混合气体中合成了一系列TiN / AlON纳米多分子。通过能量色散光谱法，X射线衍射法，高分辨率场透射电子显微镜和纳米技术评价了AlON的形成以及AlON厚度对多层结构和力学性能的影响。结果表明，Al_2O_3中的0个原子被N原子部分置换后，在Ar和N_2的混合气体中溅射Al_2O_3靶时，形成AlON。在正常沉积条件下，AlON是无定形的。但是，作为纳米倍增剂的成分，厚度小于0.6nm时，AlON由于模板效应而在TiN上被结晶化并外延生长，所得的纳米多层层产生最大硬度值为40.5GPa的超硬度效应。当AlON的厚度增加到0.6 nm时，其生长模式从晶态恢复为非晶态，外延结构被破坏，导致超硬效应消失。

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