Preparation and characterisation of PZT films by RF-magnetron sputtering

Raluca Frunza; Dan Ricinschi; Felicia Gheorghiu

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Preparation and characterisation of PZT films by RF-magnetron sputtering

机译：磁控溅射法制备PZT薄膜及其表征

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Stoichiometric films were prepared by rf-magnetron sputtering from a Pb(Zr_(0.54)Ti_(0.46))O_3 ceramic target onto Au-electroded substrates of alumina. During deposition the substrate holder was kept at a temperature of 300 °C. Post-deposition heat treatment in air at 650 °C was carried to promote the full crystallization and to result in pure perovskite PZT phase. SEM-EDX measurements for the films were performed both on surface and on cross-section. The impedance spectroscopy data demonstrates that the films have rather good dielectric properties and low losses. The recorded P-E loops prove their macroscopic ferroelectric characteristics, while piezoresponse force microscopy experiments confirm a nanoscale switching mechanism based on domain nucleation-growth.

机译：通过射频磁控溅射从Pb（Zr_（0.54）Ti_（0.46））O_3陶瓷靶材到Au电镀的氧化铝基底上制备化学计量膜。在沉积期间，将衬底支架保持在300℃的温度。在空气中于650°C进行沉积后热处理，以促进完全结晶并产生纯钙钛矿PZT相。膜的SEM-EDX测量是在表面和横截面上进行的。阻抗谱数据表明该膜具有相当好的介电性能和低损耗。记录的P-E环证明了其宏观铁电特性，而压电响应力显微镜实验证实了基于畴成核-生长的纳米级转换机制。

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《Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics》 |2011年第21期|共5页
作者
Raluca Frunza; Dan Ricinschi; Felicia Gheorghiu;
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正文语种 eng
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RF-magnetron sputtering; PbZr_xTi_(1-x)O_3 films; PFM; P(E) loops;

机译：射频磁控溅射;PbZr_xTi_（1-x）O_3薄膜;PFM;P（E）回路;

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1. Preparation and characterisation of PZT films by RF-magnetron sputtering [J] . Raluca Frunza, Dan Ricinschi, Felicia Gheorghiu Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics . 2011,第21期

机译：磁控溅射法制备PZT薄膜及其表征
2. Preparation of Transparent Metal Films, Titanium-Doped Zinc-Oxide Films (TiO2)(2) (ZnO)(98) on PEN by Using a RF-Magnetron Sputtering Method [J] . Seo Sungbo, Litao Yao, Kim Hwamin Molecular crystals and liquid crystals . 2014,第Null期

机译：射频磁控溅射法在PEN上制备透明金属膜，掺杂钛的氧化锌膜（TiO2）（2）（ZnO）（98）
3. Fabrication of nanocrystalline manganese and tin doped and undoped CdS thin films by a novel RF-magnetron sputtering technique and its characterisations [J] . Pradip Kumar Ghosh, Kalyan Kumar Chattopadhyay International Journal of Nanomanufacturing . 2008,第5期

机译：新型RF-磁控溅射技术制备锰和锡掺杂和无掺杂CdS纳米晶薄膜及其表征
4. The Preparation of Visible Light-Responsive TiO{sub}2 Thin Films by Applying a RF-Magnetron Sputtering Deposition Method and their Photocatalytic Reactivity for the Decomposition of Water with a Separate Evolution of H{sub}2 and O{sub}2 [C] . Masaaki Kitano, Hisashi Kikuchi, Takahiro Hosoda, International Symposium on the Science of Engineering Ceramics . 2006

机译：通过施加RF-磁控溅射沉积方法及其光催化反应性来制备可见光响应TiO {Sub} 2薄膜，以将水分解与H {Sub} 2和O {Sub} 2的单独演变
5. Fabrication and characterization of RF-magnetron sputtered gallium arsenide, arsenic selenium telluride, and silicon thin films. [D] . Ouyang, Li-Hsin. 2002

机译：射频磁控溅射砷化镓，碲化砷硒和硅薄膜的制备和表征。
6. Novel Physical Vapor Deposition Approach to Hybrid Perovskites: Growth of MAPbI3 Thin Films by RF-Magnetron Sputtering [O] . Sara Bonomi, Daniela Marongiu, Nicola Sestu, -1

机译：杂化钙钛矿的新型物理气相沉积方法：通过射频磁控溅射法生长MAPbI3薄膜。
7. Investigation of Co-doped PZT films deposited by rf-magnetron sputtering [O] . Felicia Gheorghiu, Radu Apetrei, Marius Dobromir, 2014

机译：用射频磁控溅射法制备共掺杂pZT薄膜的研究

Preparation and characterisation of PZT films by RF-magnetron sputtering

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