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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Magnetization processes and magnetic domain structure in weakly coupled GdCo/Si/Co trilayers
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Magnetization processes and magnetic domain structure in weakly coupled GdCo/Si/Co trilayers

机译：弱耦合的GdCo / Si / Co三层中的磁化过程和磁畴结构

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摘要

The magnetization reversal in weakly coupled GdCo(13 nm)/Si(0.8 - 2 nm)/Co(8 nm) trilayers has been studied by conventional magnetometry and layer-selective Kerr microscopy. In a very weakly coupled tri-layer system the Co layer reverses by the propagation of 180°-walls and the GdCo layer remagnetises by the nucleation and growth of patch-like domains nucleating at 360°-walls. A decrease of the non-magnetic separating layer thickness results in the magnetization reversal of both layers as a whole at low fields. Further field increase induces a magnetization reversal of the GdCo layer by the nucleation and growth of domains acting against the interlayer coupling.
机译：弱耦合的GdCo（13 nm）/ Si（0.8-2 nm）/ Co（8 nm）三层膜中的磁化反转已通过常规磁力分析和层选择性Kerr显微镜进行了研究。在非常弱耦合的三层系统中，Co层通过180°壁的传播而反转，而GdCo层通过在360°壁上成核的斑块状畴的形核和生长而重新磁化。非磁性分离层厚度的减小导致两层整体在低磁场下的磁化反转。进一步的磁场增加通过作用于层间耦合的畴的成核和生长而引起GdCo层的磁化反转。

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