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首页> 外文期刊>Journal of Materials Science >Preparation and characterization of metalorganic chemical vapor deposited nickel oxide and lithium nickel oxide thin films
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Preparation and characterization of metalorganic chemical vapor deposited nickel oxide and lithium nickel oxide thin films

机译：金属有机化学气相沉积氧化镍和锂镍氧化物薄膜的制备与表征

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摘要

Thin films of nickel oxide and lithium nickel oxide were deposited through the pyrolysis of nickel acetylacetonate and lithium nickel acetylacetonate, respectively in the temperature range 350-420 degrees C. The single solid source precursors, nickel acetylacetonate and lithium nickel acetylacetonate were prepared and characterized using Energy Dispersive X-Ray Fluorescence (EDXRF), X-Ray Diffraction (XRD) and infrared spectroscopy. The composition, optical and electrical properties of the prepared thin films were analysed using a variety of techniques, including, Rutherford Backscattering Spectroscopy (RBS), EDXRF, XRD, UV-Visible Spectrophotometry and van der Pauw conductivity method. The amount of metals in the prepared thin films did not reflect the ratio of the metals in the precursor but was found to depend on the deposition temperature. The energy gaps of the nickel oxide and lithium nickel oxide thin films are 3.7 and 3.2 eV, respectively. The electrical conductivity showed that lithium nickel oxide thin film has an activation energy of 0.11 eV. The conduction was explained by a hopping mechanism.
机译：通过分别在350-420摄氏度的温度范围内对乙酰丙酮镍镍和乙酰丙酮镍镍进行热解来沉积氧化镍和氧化镍镍的薄膜。制备了单一固体源前体，乙酰丙酮镍镍和乙酰丙酮镍镍，并利用能量色散X射线荧光（EDXRF），X射线衍射（XRD）和红外光谱。使用多种技术，包括卢瑟福背散射光谱（RBS），EDXRF，XRD，紫外可见分光光度法和范德堡电导率法，对制得的薄膜的组成，光学和电学性质进行了分析。制备的薄膜中的金属量不能反映前体中金属的比例，但是取决于沉积温度。氧化镍和锂镍氧化物薄膜的能隙分别为3.7和3.2 eV。导电性表明锂镍氧化物薄膜具有0.11eV的活化能。通过跳跃机制解释了传导。

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