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首页> 外文期刊>Journal of Materials Science >Effect of the oxygen pressure on the photoluminescence properties of ZnO thin films by PLD
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Effect of the oxygen pressure on the photoluminescence properties of ZnO thin films by PLD

机译：氧气压力对PLD法制备ZnO薄膜光致发光性能的影响

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摘要

ZnO thin films on Si(111) substrate were deposited by laser ablation of Zn target in oxygen reactive atmosphere; Nd-YAG laser with wavelength of 1064 nm was used as laser source. The experiments were performed at laser energy density of 31 J/cm(2), substrate temperature of 400 degrees C and various oxygen pressures (5-65 Pa). X-ray diffraction was applied to characterize the structure of the deposited ZnO films and the optical properties of the ZnO thin films were characterized by photoluminescence with an Ar ion laser as a light source using an excitation wavelength of 325 nm. The influence of the oxygen pressure on the structural and optical properties of ZnO thin films was investigated. It was found that ZnO film with random growth grains can be obtained under the condition of oxygen pressure 5-65 Pa. It will be clearly shown that the grain size and the formation of intrinsic defects depend on the oxygen partial pressure and that high optical quality of the ZnO films is obtained under low oxygen pressure (5 Pa, 11 Pa) conditions.
机译：在氧气反应性气氛中通过激光烧蚀Zn靶在Si（111）衬底上沉积ZnO薄膜;使用波长为1064 nm的Nd-YAG激光作为激光源。实验在31 J / cm（2）的激光能量密度，400摄氏度的基板温度和各种氧气压力（5-65 Pa）下进行。进行X射线衍射以表征所沉积的ZnO膜的结构，并且通过使用325nm的激发波长的Ar离子激光器作为光源的光致发光来表征ZnO薄膜的光学性质。研究了氧气压力对ZnO薄膜结构和光学性能的影响。发现在氧气压力为5-65 Pa的条件下可以获得具有随机生长晶粒的ZnO膜。可以清楚地表明，晶粒尺寸和固有缺陷的形成取决于氧气分压和高光学质量ZnO薄膜的一部分是在低氧气压力（5 Pa，11 Pa）条件下获得的。

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