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首页> 外文期刊>Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology >In situ TPR removal: a generic method for fabricating tubular array devices with mechanical and structural soundness, and functional robustness on various substrates
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In situ TPR removal: a generic method for fabricating tubular array devices with mechanical and structural soundness, and functional robustness on various substrates

机译：原位TPR去除：一种在各种基板上制造具有机械和结构稳固性以及功能稳健性的管状阵列器件的通用方法

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摘要

Wire array templates have been utilized for fabricating various three-dimensional tubular structure devices, such as solar cells, batteries and supercapacitors, as well as electronic and photonic devices. It is necessary to remove the templates by using post-treatments such as wet chemical etching, decomposition, or Kirkendall approaches. However, it remains a challenge to ensure tubular structure integrity, mechanical soundness, and chemical purity during the template removal process, which affects the functional robustness of enabled tubular structure array devices. In this work, by utilizing ZnO nanorod array devices as templates and temperature programmed reduction (TPR) as the removal method, nanotube array devices made of various functional oxides have been directly converted with well-retained uniformity, structure and mechanical soundness, and chemical homogeneity on both two-dimensional (2D) planar and three-dimensional (3D) monolith device substrates. The successful examples range from binary metal oxides such as fluorite CeO2 to complex oxides like perovskite La_(0.8)Sr_(0.2)CoO3 (LSCO). This TPR removal method is generic, simple and rationally controllable, and can be easily expanded to the preparation of other oxides and non-oxide tubular structure devices regardless of the interfaced device substrate geometry. As a demonstration, the enabled CeO2 nanotube array devices could function as good high-temperature O2 sensors and active photocatalytic devices with good robustness.
机译：线阵列模板已经用于制造各种三维管状结构的器件，例如太阳能电池，电池和超级电容器，以及电子和光子器件。必须使用后处理（例如湿法化学蚀刻，分解或Kirkendall方法）删除模板。然而，在模板去除过程中确保管状结构的完整性，机械强度和化学纯度仍然是一项挑战，这会影响已启用的管状结构阵列设备的功能坚固性。在这项工作中，通过使用ZnO纳米棒阵列器件作为模板，并以程序升温还原（TPR）作为去除方法，由各种功能性氧化物制成的纳米管阵列器件已被直接转换为具有良好保持的均匀性，结构和机械稳固性以及化学均一性在二维（2D）平面和三维（3D）整体装置衬底上都可以使用。成功的例子包括二元金属氧化物（例如萤石CeO2）到复合氧化物（钙钛矿型La_（0.8）Sr_（0.2）CoO3（LSCO））。这种TPR去除方法是通用的，简单的且可合理控制的，并且可以很容易地扩展到其他氧化物和非氧化物管状结构器件的制备中，而不管所连接的器件衬底的几何形状如何。作为演示，启用的CeO2纳米管阵列设备可以用作良好的高温O2传感器和具有良好鲁棒性的有源光催化设备。

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