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首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Interfacial reactions between tellurite melts and silica during the production of microstructured optical devices
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Interfacial reactions between tellurite melts and silica during the production of microstructured optical devices

机译：在微结构光学器件生产过程中，亚碲酸盐熔体与二氧化硅之间的界面反应

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摘要

Interfacial reactions between silica glass and tellurite melts were studied under confined conditions in the temperature regime of 400-700 °C, applying two different sampling techniques: isothermal heat-treatment of a several micrometer thick tellurite film, confined in a silica/tellurite/silica sandwich, and capillary filling of tellurite melts into silica microcapillaries. The sandwich technique provides detailed ex situ insights on the interface chemistry, microstructure and diffusion after given treatment times and temperatures. Data on dynamic viscosity, surface tension, wetting behaviour and eventual scaling effects was obtained from the capillary filling technique. For temperatures > 500 °C, silica is completely wet by the considered tellurite melts. At T > 600 °C and for a treatment time of 20 min or longer, cationic diffusion of Na~+ and Te~(4+) into the silica substrate occurs to a depth of several micrometers. At the same time, the tellurite melt attacks the silica surface, leading to the formation of a stationary silica-tellurite reaction layer and silica dissolution. Dissolved silica was observed to re-precipitate from the tellurite melt by liquid-liquid phase separation. In the early reaction stages, as a result of alkali diffusion into the silica substrate, β-quartz crystallizes at the interface (what can be avoided by using alkali-free filling glasses). Obtained data set the boundary conditions for the generation of tellurite-silica all-solid fiber waveguides by melt infiltration of silica photonic crystal fibers or microcapillaries.
机译：在两种条件下，采用两种不同的采样技术，在400-700°C的温度条件下，研究了石英玻璃与碲酸盐熔体之间的界面反应：等温热处理几微米厚的碲酸盐薄膜，限制在二氧化硅/碲酸盐/二氧化硅中三明治，然后将亚碲酸盐的毛细管填充物熔化成二氧化硅微毛细管。在给定的处理时间和温度下，三明治技术可提供有关界面化学，微观结构和扩散的详细的异位见解。动态粘度，表面张力，润湿行为和最终结垢效应的数据是通过毛细管填充技术获得的。对于> 500°C的温度，考虑到的亚碲酸盐熔体会完全润湿二氧化硅。在T> 600°C和20分钟或更长时间的处理时间下，Na〜+和Te〜（4+）阳离子扩散到二氧化硅基质中的深度达到了几微米。同时，亚碲酸盐熔体侵蚀二氧化硅表面，导致形成固定的二氧化硅-碲石反应层并溶解二氧化硅。通过液-液相分离，观察到溶解的二氧化硅从亚碲酸盐熔体中再沉淀。在早期反应阶段，由于碱扩散到二氧化硅基质中，β-石英在界面处结晶（使用无碱填充玻璃可以避免这种情况）。获得的数据为通过硅石光子晶体纤维或微毛细管的熔渗生成碲金属硅石全固态光纤波导设置了边界条件。

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