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首页> 外文期刊>Journal of Molecular Structure >Investigation of solid state imidization reactions of the vapour deposited azo-polyimide thin films by FTIR spectroscopy
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Investigation of solid state imidization reactions of the vapour deposited azo-polyimide thin films by FTIR spectroscopy

机译：FTIR光谱研究气相沉积偶氮聚酰亚胺薄膜的固态酰亚胺化反应

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In this paper solid state imidization reactions of azo-polyimide thin films prepared at different temperatures have been investigated by FTIR spectroscopy. The starting precursors DAAB (4,40-diaminoazobenzene) and PMDA (pyromellitic dianhydride) were vacuum deposited as thin films. It was estimated that the necessity of the following thermal treatment 1 h at 300 °C are appropriate conditions for imidization of the initial PMDA-DAAB mix to Azo-PI (azo-polyimide) film. The parameters have been selected experimentally (temperatures, deposition rates, mode of substrates, etc.), for the vapour deposition of the precursors in view to prepare layers with a high imidization degree, reproducible composition and structure, which determined the film properties. Due to their magnetic anisotropy and cis-trans-cis isomerization cycle the azo-polymer films are promising material for application in optics, optoelectronics, sensors, etc. For this reason a study of the kinetics of solid state imidization reactions at different temperatures is carried out. It is identified and discussed that the imide III band intensity at 1363-1381 cm?1 characterizing imide ring is different at three temperatures.
机译：本文通过FTIR光谱研究了在不同温度下制备的偶氮聚酰亚胺薄膜的固态酰亚胺化反应。将起始前体DAAB（​​4,40-二氨基偶氮苯）和PMDA（均苯四甲酸二酐）真空沉积为薄膜。据估计，在300°C下进行1 h热处理的必要条件是将初始PMDA-DAAB混合物酰亚胺化为Azo-PI（偶氮聚酰亚胺）薄膜的合适条件。为了制备具有高酰亚胺化度，可再现的组成和结构的层，其决定了膜的性能，已经通过实验选择了用于前体的气相沉积的参数（温度，沉积速率，基板的模式等）。由于它们的磁各向异性和顺-反-顺异构化循环，偶氮聚合物薄膜是有前途的材料，可用于光学，光电，传感器等。因此，需要对不同温度下的固态酰亚胺化反应动力学进行研究。出来。已经确定并讨论了在1363-1381cm 2处表征酰亚胺环的酰亚胺III能带强度在三个温度下是不同的。

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