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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Extended wide band gap amorphous aluminium-doped zinc oxide thin films grown at liquid nitrogen temperature
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Extended wide band gap amorphous aluminium-doped zinc oxide thin films grown at liquid nitrogen temperature

机译:在液氮温度下生长的宽禁带非晶铝掺杂氧化锌薄膜

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摘要

Amorphous aluminium-doped zinc oxide (AZO) thin films are grown by standard RF sputtering at low temperatures on glass substrates. Due to poor thermal conductivity and thermal energy generated by the sputter gun, controlling the substrate surface temperature is the key to controlling the growth of amorphous and nanocrystalline films. The ratio of grains and amorphous part of the films can be controlled by selective growth conditions. During a transmission electron microscope (TEM) inspection process, the amorphous films react immediately and strongly with an electron beam and transform to a mixture of amorphous and nanocrystalline phases. The films having a mixture of amorphous and nanocrystalline phases, either as-grown or after transformation by irradiation of the electron beam, are stable in the TEM inspection, indicating that the low interface energy stabilizes the mixture phase. The optical band gap increases with the content of amorphous phase and is 4.3 eV for pure amorphous AZO films.
机译:非晶铝掺杂的氧化锌(AZO)薄膜是通过标准RF溅射在低温下在玻璃基板上生长的。由于溅射枪产生的导热性和热能差,控制基板表面温度是控制非晶和纳米晶体薄膜生长的关键。膜的晶粒和非晶部分的比例可以通过选择生长条件来控制。在透射电子显微镜(TEM)检查过程中,非晶态膜立即与电子束发生强烈反应,并转变为非晶态和纳米晶相的混合物。具有非晶态和纳米晶相混合物的薄膜,无论是已生长的还是在通过电子束辐照而转变后的薄膜,在TEM检查中都是稳定的,表明低界面能稳定了混合物相。光学带隙随非晶相含量的增加而增加,对于纯非晶AZO膜而言,其带隙为4.3 eV。

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