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Nanoresolution patterning of hydrogenated graphene by electron beam induced C-H dissociation

机译:电子束诱导C-H离解的氢化石墨烯的纳米尺度图案化

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Direct writing of semi-conductive or insulative nanopatterns on graphene surfaces is one of the major challenges in the application of graphene in flexible and transparent electronic devices. Here, we demonstrate that nanoresolution patterning on hydrogenated graphene can be approached by using electron beam induced C-H dissociation when the electron accelerating voltage is beyond a critical voltage of 3 kV. The resolution of the patterning reaches 18 nm and remains constant as the accelerating voltage is beyond 15 kV. The origin of the nanoresolution pattering as well as the dependence of the resolution on voltage in this technique is well explained by studying the cross-section of the C-H bond under electron impact. This work constitutes a new approach to fabricate graphene-based electronic nanodevices, with the reduced hydrogenated graphene channel utilized as conductive or semi-conductive counterpart in the structure.
机译:在石墨烯表面上直接写入半导电或绝缘纳米图案是石墨烯在柔性透明电子设备中应用的主要挑战之一。 这里,我们证明当电子加速电压超出3kV的临界电压时,可以通过使用电子束诱导的C-H离解来接近氢化石墨烯的纳米尺变图案化。 图案化的分辨率达到18nm,随着加速电压超过15kV,保持恒定。 通过在电子撞击下研究C-H键的横截面,纳米尺变图案化的起源以及分辨率对该技术中的电压的依赖性得到了很好的解释。 该作品构成了制造基于石墨烯的电子纳米型的新方法,其中氢化石墨烯通道的还原为在该结构中用作导电或半导体对应物。

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