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Confirming the key role of Ar+ ion bombardment in the growth feature of nanostructured carbon materials by PECVD

机译：通过PECVD确认Ar +离子轰击在纳米结构碳材料生长特征中的关键作用

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摘要

In order to confirm the key role of Ar+ ion bombardment in the growth feature of nanostructured carbon materials (NCMs), here we report a novel strategy to create different Ar+ ion states in situ in plasma enhanced chemical vapor deposition (PECVD) by separating catalyst film from the substrate. Different bombardment environments on either side of the catalyst film were created simultaneously to achieve multi-layered structural NCMs. Results showed that Ar+ ion bombardment is crucial and complex for the growth of NCMs. Firstly, Ar+ ion bombardment has both positive and negative effects on carbon nanotubes (CNTs). On one hand, Ar+ ions can break up the graphic structure of CNTs and suppress thin CNT nucleation and growth. On the other hand, Ar+ ion bombardment can remove redundant carbon layers on the surface of large catalyst particles which is essential for thick CNTs. As a result, the diameter of the CNTs depends on the Ar+ ion state. As for vertically oriented few-layer graphene (VFG), Ar+ ions are essential and can even convert the CNTs into VFG. Therefore, by combining with the catalyst separation method, specific or multi-layered structural NCMs can be obtained by PECVD only by changing the intensity of Ar+ ion bombardment, and these special NCMs are promising in many fields.
机译：为了确认AR +离子轰击在纳米结构碳材料（NCMS）的生长特征中的关键作用，在这里，我们通过分离催化剂膜来报告一种新的策略以原位在等离子体增强的化学气相沉积（PECVD）中形成不同的Ar +离子状态来自基材。同时产生催化剂薄膜两侧的不同轰击环境以实现多层结构NCM。结果表明，AR +离子轰击是NCMS的生长至关重要的。首先，Ar +离子轰击对碳纳米管（CNT）具有正面和负面影响。一方面，Ar +离子可以分解CNT的图形结构并抑制薄的CNT成核和生长。另一方面，AR +离子轰击可以去除大催化剂颗粒表面上的冗余碳层，这对于厚的CNT是必不可少的。结果，CNT的直径取决于AR +离子状态。对于垂直定向的几层石墨烯（VFG），Ar +离子是必需的，甚至可以将CNT转化为VFG。因此，通过与催化剂分离方法组合，通过改变AR +离子轰击的强度，可以通过PECVD获得特异性或多层面的结构NCM，并且这些特殊的NCM在许多领域都具有很大。

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  • 来源
    《Nanotechnology》 |2017年第47期|共11页
  • 作者

    Liu Yulin; Lin Jinghuang; Jia Henan; Chen Shulin; Qi Junlei; Qu Chaoqun; Cao Jian; Feng Jicai; Fei Weidong;

  • 作者单位

    Harbin Inst Technol State Key Lab Adv Welding &

    Joining Harbin 150001 Heilongjiang Peoples R China;

    Harbin Inst Technol State Key Lab Adv Welding &

    Joining Harbin 150001 Heilongjiang Peoples R China;

    Harbin Inst Technol State Key Lab Adv Welding &

    Joining Harbin 150001 Heilongjiang Peoples R China;

    Harbin Inst Technol State Key Lab Adv Welding &

    Joining Harbin 150001 Heilongjiang Peoples R China;

    Harbin Inst Technol State Key Lab Adv Welding &

    Joining Harbin 150001 Heilongjiang Peoples R China;

    Jilin Normal Univ Key Lab Funct Mat Phys &

    Chem Minist Educ Siping Peoples R China;

    Harbin Inst Technol State Key Lab Adv Welding &

    Joining Harbin 150001 Heilongjiang Peoples R China;

    Harbin Inst Technol State Key Lab Adv Welding &

    Joining Harbin 150001 Heilongjiang Peoples R China;

    Harbin Inst Technol State Key Lab Adv Welding &

    Joining Harbin 150001 Heilongjiang Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    nanostructured carbon materials; plasma etching; PECVD; CNTs; VFG;

    机译：纳米结构碳材料;等离子体蚀刻;PECVD;CNT;VFG;

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