Dispersion of nonlinear refractive index in layered WS2 and WSe2 semiconductor films induced by two-photon absorption

Dong Ningning; Li Yuanxin; Zhang Saifeng; McEvoy Niall; Zhang Xiaoyan; Cui Yun; Zhang Long; Duesberg Georg S.; Wang Jun

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Dispersion of nonlinear refractive index in layered WS2 and WSe2 semiconductor films induced by two-photon absorption

机译：非线性折射率在双光子吸收诱导的分层WS2和WSE2半导体膜中的分散

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Both the nonlinear absorption and nonlinear refraction properties of WS2 and WSe2 semiconductor films have been characterized by using Z-scan technique with femtosecond pulses at the wavelength of 1040 nm. It is found that these films have two-photon absorption response with the nonlinear absorption coefficient of similar to 103 cmGW-1, and a dispersion of nonlinear refractive index in the WS2 films that translated from positive in the monolayer to negative in bulk materials. (C) 2016 Optical Society of America

机译：通过在波长为1040nm的波长下使用Z扫描技术，已经表征了WS2和WSE2半导体膜的非线性吸收和非线性折射特性。发现这些薄膜具有与103cmgw-1类似的非线性吸收系数的双光子吸收响应，以及在单层中的阳性阳性的WS2膜中的非线性折射率的分散体。（c）2016年光学学会

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来源
《Optics Letters》 |2016年第17期|共4页
作者
Dong Ningning; Li Yuanxin; Zhang Saifeng; McEvoy Niall; Zhang Xiaoyan; Cui Yun; Zhang Long; Duesberg Georg S.; Wang Jun;
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作者单位

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;

Trinity Coll Dublin Adv Mat &

BioEngn Res AMBER Ctr Dublin 2 Ireland;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;

Trinity Coll Dublin Adv Mat &

BioEngn Res AMBER Ctr Dublin 2 Ireland;

Chinese Acad Sci Shanghai Inst Opt &

Fine Mech Key Lab Mat High Power Laser Shanghai 201800 Peoples R China;

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正文语种 eng
中图分类计量学;光学;
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1. Dispersion of nonlinear refractive index in layered WS2 and WSe2 semiconductor films induced by two-photon absorption [J] . Dong Ningning, Li Yuanxin, Zhang Saifeng, Optics Letters . 2016,第17期

机译：非线性折射率在双光子吸收诱导的分层WS2和WSE2半导体膜中的分散
2. Direct Observation of Degenerate Two-Photon Absorption and Its Saturation in WS2 and MoS2 Mono layer and Few-Layer Films [J] . Zhang Saifeng, Dong Ningning, McEvoy Niall, ACS nano . 2015,第7期

机译：在WS2和MoS2单层膜和少量膜中退化双光子吸收及其饱和度的直接观察
3. Two-photon absorption and nonlinear refraction of birefringent mesoporous silicon films [J] . Gayvoronsky V.Ya., Golovan L.A., Kopylovsky M.A., Quantum electronics . 2011,第3期

机译：双折射介孔硅膜的双光子吸收和非线性折射
4. Two-photon absorption and the dispersion of nonlinear refraction using a white-light continuum Z-scan [C] . Balu, M., Hales, . 2005

机译：使用白光连续体Z扫描的双光子吸收和非线性折射色散
5. On nonlinear refraction and two-photon absorption in optical media. [D] . DeSalvo, John Richard. 1993

机译：关于光学介质中的非线性折射和双光子吸收。
6. Pressure coefficients for direct optical transitions in MoS2 MoSe2 WS2 and WSe2 crystals and semiconductor to metal transitions [O] . F. Dybała, M. P. Polak, J. Kopaczek, -1

机译：MoS2MoSe2WS2和WSe2晶体中直接光学跃迁和半导体到金属跃迁的压力系数
7. Nonlinear change of refractive index of Co3O4 thin films induced by semiconductor laser (lambda=405 nm) irradiation [O] . Yamamoto H, Tanaka S, Naito T, 2002

机译：半导体激光（λ= 405 nm）辐照引起的Co3O4薄膜折射率的非线性变化

Dispersion of nonlinear refractive index in layered WS2 and WSe2 semiconductor films induced by two-photon absorption

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