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首页> 外文期刊>Physica, B. Condensed Matter >Non-volatile resistive switching in the Mott insulator (V1-xCrx)(2)O-3
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Non-volatile resistive switching in the Mott insulator (V1-xCrx)(2)O-3

机译:MOTT绝缘体(V1-XCRX)(2)O-3中的非易失性电阻切换

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摘要

The discovery of non-volatile resistive switching in Mott insulators related to an electric-field-induced insulator to metal transition (IMT) has paved the way for their use in a new type of non-volatile memories, the Mott memories. While most of the previous studies were dedicated to uncover the resistive switching mechanism and explore the memory potential of chalcogenide Mott insulators, we present here a comprehensive study of resistive switching in the canonical oxide Mott insulator (V1-xCrx)(2)O-3. Our work demonstrates that this compound undergoes a non-volatile resistive switching under electric field. This resistive switching is induced by a Mott transition at the local scale which creates metallic domains closely related to existing phases of the temperature-pressure phase diagram of (V1-xCrx)(2)O-3. Our work demonstrates also reversible resistive switching in (V1-xCrx)(2)O-3 crystals and thin film devices. Preliminary performances obtained on 880 nm thick layers with 500 nm electrodes show the strong potential of Mott memories based on the Mott insulator (V1-xCrx)(2)O-3.
机译:在与电场诱导的绝缘体与金属转换(IMT)相关的Mott绝缘体中的非易失性电阻切换的发现已经为其在一种新型的非易失性存储器中使用的方式铺平了方式。虽然以前的大多数研究致力于揭示电阻式切换机制并探索硫属元素化物Mott绝缘体的记忆力,我们在这里综合研究了规范氧化物莫特绝缘体(V1-XCRX)(2)O-3的电阻切换。我们的作品表明,该化合物在电场下进行了非易失性的电阻切换。该电阻切换由局部等级的Mott转变诱导,该局部刻度产生与(V1-XCRX)(2)O-3的温度 - 压力相图的现有相密切相关的金属域。我们的作品还演示了(V1-XCRX)(2)O-3晶体和薄膜装置的可逆电阻切换。在880nm厚层上获得的初步性能,具有500nm电极,显示基于Mott绝缘体(V1-XCRX)(2)O-3的Mott存储器的强势。

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