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首页> 外文期刊>Physica, B. Condensed Matter >Refraction-reflection of electrons at lateral metallic interfaces
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Refraction-reflection of electrons at lateral metallic interfaces

机译：侧向金属界面上电子的折射反射

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Abstract Electron boundary element method (EBEM) has been employed to simulate electron refraction at the lateral interface between two homogenous metals featuring surface states characterized by isotropic constant energy surfaces. A decent agreement was achieved between the real-space EBEM simulations and the wave-space analysis obtained from electron plane wave expansion (EPWE) method. Calculations were performed for three different electron energies, being ?0.05, ?0.15, and ?0.25eV, where the reference energy is set to ?0.4eV, i.e., the band minimum of the Cu(111) surface state. For an interface separating two metals with the same effective mass (0.41 m e) and a potential difference of 0.2eV, we demonstrate that electrons with the first two energies exhibit refraction at the interface, following the Snell's law, and total internal reflections occur beyond energy-dependent critical angles, whereas for the third electron energy, a total internal reflection occurs at all incident angles. These findings were used to simulate optical elements such as convex lenses and possible guiding through perfect electron mirrors, in contrast to Bragg-based guiding. Given the varieties of possible means of manipulating the dispersion parameters via surface adsorbates and thin-film growth, the degree of electron refraction-reflection at metallic interfaces could be precisely tuned.
机译：<！[cdata [ 抽象 电子边界元方法（EBEM）已经采用了在两个均质金属之间模拟电子折射，其具有各向同性恒能的表面状态表面。实际空间EBEM模拟和从电子平面波膨胀（EPWE）方法获得的波浪空间分析之间实现了一种体面的协议。对三种不同的电子能量进行计算，存在？0.05，？0.15和？0.25 EV，其中参考能量设置为0.4 EV，即Cu（111）表面状态的频带。对于将两个金属分离出具有相同有效质量的界面（0.41 M E ）以及0.2 < CE：HSP SP =“0.25”/> EV，我们证明了在Snell的定律之后，具有前两个能量的电子在界面上展示折射，并且全内反射发生超出能量依赖性的临界角度，而对于第三电子能源，在所有入射角发生全内反射。与布拉格的引导相比，这些发现用于模拟诸如凸透镜的光学元件，例如凸透镜，并且可能引导通过完美的电子反射镜。鉴于通过表面吸附和薄膜生长操纵分散参数的可能手段，可以精确调整金属界面上的电子折射反射程度。

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