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首页> 外文期刊>Surface & Coatings Technology >Ion nitriding of pure iron using high-density plasma beam generated by a tubular plasma source
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Ion nitriding of pure iron using high-density plasma beam generated by a tubular plasma source

机译：用管状等离子体源产生的高密度等离子束离子氮化纯铁

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A tubular plasma source was developed to generate high-density plasma beam for nitriding using N-2 + H-2 mixture as working gas. The plasma source was demonstrated to be capable of generating a plasma plume with density of N-2(+) as high as similar to 7.2 +/- 0.6 x 10(11) cm(-3) in N-2 + H-2 mixed gases with N-2 content changed from 92.5% to 32.5%. After nitriding at 450 degrees C for 120 min, similar to 5-mu m thick compound layers formed on the sample surface of pure iron with diffusion zone as deep as 0.4 mm, leading to 7.5- 8.5 GPa hardness. In addition, nitriding of pure iron could be realized at a low temperature as low as 250 degrees C, producing a compound layer with a thickness of-2.5 pm. After nitriding for 120 min at temperatures of 330-500 degrees C, the high-density plasma flow could produce a compound layer of 4- 5 mu m with hardness of 10 GPa. N-2(+) and N+ are suggested to be responsible for the nitriding, of pure iron by the high-density plasma beam. The tubular plasma source allows us using N2 + H2 mixed gas with low hydrogen content for high-efficient nitriding. The gas temperature in plasma plume is similar to 300 degrees C, and thus is acceptable for low-temperature nitriding. (C) 2016 Elsevier B.V. All rights reserved.
机译：开发了一种管状等离子体源以产生高密度等离子体光束，用于使用N-2 + H-2混合物作为工作气体氮化。证据了等离子体源能够能够产生具有N-2（+）的密度的等离子体羽状，高于N-2 + H-2中的7.2 +/- 0.6×10（11）cm（-3）用N-2含量的混合气体从92.5％变为32.5％。在450℃下氮化120分钟后，类似于5μm厚的化合物层，形成在纯铁的样品表面上，扩散区深度为0.4mm，导致7.5-8.5GPa硬度。此外，纯铁的氮化可以在低至250℃的低温下实现，产生厚度为-20μm的复合层。在330-500℃的温度下氮化120分钟后，高密度等离子体流动可以产生4-5μm的化合物层，其硬度为10GPa。建议使用高密度等离子体束负责氮铁的氮铁的负责N-2（+）和N +。管状等离子体源允许我们使用具有低氢含量的N 2 + H 2混合气体，以高效氮化。等离子体羽流中的气体温度类似于300℃，因此对于低温氮化是可接受的。 （c）2016 Elsevier B.v.保留所有权利。

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