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A comparative study of fatigue properties of TiVN and TiNbN thin films deposited on different substrates

机译:不同基材上沉积的TIVN和TINBN薄膜疲劳性能的对比研究

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AbstractTransition metal nitrides, especially ternary phase films attract attention due to their high mechanical and tribological features. Besides these, fatigue properties play a very important role on the performance in service life of these types of films. TiVN and TiNbN films were deposited on M2 and H13 steel substrates by reactive magnetron sputtering system. Fatigue properties of the films were characterized via multipass scratch tests. 100, 250 and 500cycles with bidirectional multipass scratch tests were conducted at room temperature by applying 20N constant load. Structural properties were determined with X-ray diffraction, scanning electron microscopy and energy dispersive spectroscopy. Mechanical features of the films were observed with nano hardness tests. Fatigue behaviors, deformation types, coefficient of frictions of the films and effect of different substrates were discussed comparatively. According to the results, the TiVN films showed better fatigue resistance than the TiNbN films although critical adhesion load value of the TiNbN films was higher than the TiVN films. The TiVN films generally showed ductile type cracks at the edge of the tracks and the TiNbN films showed more brittle type cracks. Additionally, the films deposited on M2 substrates exhibited better strength than those of H13 substrates.Highlights
机译:<![cdata [ 抽象 过渡金属氮化,特别是三元相膜引起的高机械和摩擦学特征。除此之外,疲劳性能在这些类型的电影的使用寿命性能方面发挥着非常重要的作用。通过反应性磁控溅射系统沉积在M2和H13钢基板上的TiVn和Tinbn膜。通过多脂划痕试验表征薄膜的疲劳性能。通过施加20N恒定载荷,在室温下进行100,250和500次,通过室温进行。用X射线衍射,扫描电子显微镜和能量分散光谱测定结构性质。用纳米硬度试验观察薄膜的机械特征。相对讨论了疲劳行为,变形类型,薄膜的摩擦系数和不同底物的效果。根据结果​​,TIVN薄膜显示出比TiNBN薄膜更好的疲劳电阻,尽管锡膜的临界粘合载荷值高于TIVN薄膜。 TiVn膜通常在轨道边缘显示延性型裂缝,并且罐膜膜显示出更脆的裂缝。另外,沉积在M2底物上的薄膜表现出比H13衬底更好的强度。 突出显示

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