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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Effect of discharge power and silicon content on optical and mechanical properties of carbon-rich amorphous silicon carbide films obtained by PECVD
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Effect of discharge power and silicon content on optical and mechanical properties of carbon-rich amorphous silicon carbide films obtained by PECVD

机译：放电功率和硅含量对PECVD获得的富含碳无定形碳化硅膜的光学和力学性能的影响

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摘要

We studied optical and mechanical properties of a-SixC1-x:H films prepared by the PECVD technique from the mixture of CH4, SiH4, H-2 and Ar. RF discharge power and silane flow rate were chosen as parameters of the film deposition process that allowed to vary film properties. It was shown that variations of silane flow rate (10, 20 sccm) and discharge power in the 100-300 W range allow to obtain films with the following characteristics: optical bandgap 2.5-4.1 eV; refractive index of 1.8-2.1; hardness (H) 8.6 -14.8 GPa; Young modulus (E) 64-143 GPa. The film deposition rate varied from 10 to 35 nm/min. By selecting deposition regimes, we deposited films with high ratio between film hardness and Young modulus (H/E = 0.13). The variations of optical and mechanical properties of the films by changing discharge power and silane flow are interpreted within a model accounting film composition and phase-structural transformations. Good combination of optical and mechanical properties of the developed films makes them promising for application as protective, passivation and anti-reflection coatings. (C) 2019 Elsevier B.V. All rights reserved.
机译：我们研究了通过PECVD技术从CH4，SiH4，H-2和Ar的混合物制备的A-S16C1-X：H膜的光学和机械性能。选择RF放电功率和硅烷流量作为允许改变膜性质的膜沉积过程的参数。结果表明，100-300W范围内的硅烷流速（10,20ccm）和放电功率的变化允许获得具有以下特性的薄膜：光学带隙2.5-4.1eV; 1.8-2.1的折射率;硬度（h）8.6 -14.8 GPA;幼模（e）64-143 GPA。薄膜沉积速率从10至35nm / min变化。通过选择沉积制度，我们在膜硬度和杨氏模量之间具有高比率的薄膜（H / E = 0.13）。通过改变放电功率和硅烷流动通过改变放电功率和硅烷流动的光学和力学性能的变化被解释在模型会计膜组合物和相位结构变换中。发达膜的光学和力学性能的良好组合使其有望应用于保护性，钝化和抗反射涂层。 （c）2019 Elsevier B.v.保留所有权利。

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