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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Straightforward prediction of the Ni1-xO layers stoichiometry by using optical and electrochemical measurements
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Straightforward prediction of the Ni1-xO layers stoichiometry by using optical and electrochemical measurements

机译:使用光学和电化学测量,Ni1-XO层化学计量的直接预测

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摘要

In this study, we propose a straightforward method for x determination in sub-stoichiometric nickel oxide (Ni1-xO) films prepared by ultrasonic spray pyrolysis on fluor-tin oxide (FTO) substrates by varying the post-deposition thermal treatment. The Ni3+ concentration, the flat band potential (Phi(fb)) and the open circuit potential (V-oc) were determined by electrochemical impedance analysis in aqueous media and correlated to the transmission of Ni1-xO films. An x-ray photoelectron spectroscopy study was also performed to quantify the amount of Ni3+ in the films and compare it with the one determined by electrochemical analysis. The electrochromic behavior of the Ni1-xO films in non-aqueous electrolyte was investigated as well.
机译:在该研究中,通过改变沉积后热处理,提出了通过超声波喷雾(FTO)基材上通过超声波喷雾热解制备的亚化学计量氧化镍(Ni1-XO)膜中的X测定方法。 通过水性介质中的电化学阻抗分析确定Ni3 +浓度,平带电位(PHI(FB))和开路电位(V-OC),并与Ni1-XO膜的透射相关。 还进行了X射线光电子能谱研究以定量薄膜中Ni3 +的量,并将其与通过电化学分析确定的物质进行比较。 研究了非水电解质中Ni1-XO膜的电致变色行为。

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