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首页> 外文期刊>Acta biomaterialia >Controlled surface modification of Ti-40Nb implant alloy by electrochemically assisted inductively coupled RF plasma oxidation
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Controlled surface modification of Ti-40Nb implant alloy by electrochemically assisted inductively coupled RF plasma oxidation

机译：电化学辅助感应耦合RF等离子体氧化对Ti-40Nb植入合金的受控表面改性

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摘要

Low temperature metal oxidation induced by plasma in the absence of liquid electrolytes can be useful for the surface preparation of orthopedic devices since residues from these may be harmful and need to be removed before implantation. In this study the oxidation of Ti-40Nb for biomedical application was achieved by employing an inductively coupled radio frequency oxygen plasma. The correlation between the growth mode of the surface oxide and the electric conductivity ratio of the plasma and the oxide phase were studied by varying the sample temperature, oxygen gas pressure and additional bias potential. The plasma treated samples were characterised by confocal laser microscopy, SEM, EBSD, XPS, TEM and ToF-SIMS. The surface energy was determined by contact angle measurements using the Owens-Wendt-Rabel-Kaelble method. Well adhering oxide layers consisting of TiO2 and Nb2O5 with thicknesses between 50 and 150 nm were obtained. Surface roughness values and microstructure indicate that the growth mode of the oxide can be well controlled by the sample temperature and oxygen gas pressure. At temperatures above 450 C a migration of Ti ions towards the surface controls the growth process. A bias potential higher than +50 V causes rough and defective surfaces with high surface energies.
机译：在不存在液体电解质的情况下，由等离子体诱导的低温金属氧化可用于整形外科设备的表面制备，因为这些设备中的残留物可能有害并且需要在植入前去除。在这项研究中，通过使用感应耦合的射频氧等离子体实现了用于生物医学应用的Ti-40Nb的氧化。通过改变样品温度，氧气压力和附加偏压，研究了表面氧化物的生长方式与等离子体和氧化物相的电导率之间的关系。通过共聚焦激光显微镜，SEM，EBSD，XPS，TEM和ToF-SIMS对经过等离子体处理的样品进行表征。通过使用Owens-Wendt-Rabel-Kaelble方法的接触角测量来确定表面能。获得了由TiO2和Nb2O5组成的具有50至150 nm厚度的良好粘合的氧化物层。表面粗糙度值和微观结构表明，可以通过样品温度和氧气压力很好地控制氧化物的生长方式。在高于450°C的温度下，Ti离子向表面的迁移控制了生长过程。高于+50 V的偏置电势会导致具有高表面能的粗糙且有缺陷的表面。

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