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Synthesis of silicon-doped reduced graphene oxide and its applications in dye-sensitive solar cells and supercapacitors

机译:硅掺杂的石墨烯氧化物的合成及其在染料敏感太阳能电池和超级电容器中的应用

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摘要

Heteroatom-doping of graphene is of fundamental importance to enable a wide range of optoelectronic and energy storage devices while exploring their basic material properties. Herein, a facile and low-cost method is presented to synthesize the silicon-doped reduced graphene oxide (Si-rGO) via annealing treatment of triphenylsilane and graphene oxide. Compared to the pristine reduced graphene oxide (rGO), Si-rGO exhibits significant enhancement in electrocatalytic and electrochemical properties: when Si-rGO is used as a metal-free electrocatalyst in counter electrodes in dye-sensitized solar cells (DSSCs), the conversion efficiency is increased by 29.6%; when Si-rGO is used as an active electrode in a supercapacitor, the specific capacity is increased by 48.5%. This suggests that silicon doping can effectively improve the electrocatalytic ability and electrochemical performance. It is promising for Si-rGO to be used as a metal-free catalytic and active material.
机译:石墨烯的杂原子掺杂是至关重要的,以实现各种光电和能量存储装置,同时探索其基本材料特性。 这里,提出了一种容易和低成本的方法,以通过退火处理通过三苯基硅烷和石墨烯氧化物来合成硅掺杂的氧化石墨烯(Si-Rgo)。 与原始的石墨烯氧化物(RGO)相比,Si-Rgo在电催化和电化学性质上表现出显着的增强:当Si-Rgo被用作染料敏化太阳能电池(DSSCs)的反电极中的无金属电催化剂时,转换 效率提高了29.6%; 当Si-rgo用作超级电容器中的活性电极时,比容量增加48.5%。 这表明硅掺杂可以有效地改善电催化能力和电化学性能。 它很有希望Si-rgo用作无金属催化和活性材料。

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  • 来源
    《RSC Advances》 |2016年第18期|共7页
  • 作者单位

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Aarhus Univ Dept Engn DK-8000 Aarhus C Denmark;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Peoples R China;

    Aarhus Univ Interdisciplinary Nanosci Ctr iNANO DK-8000 Aarhus C Denmark;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
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