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Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

机译:使用模板辅助Ni电沉积和热转印过程制备透明的Ni-NaNOmshesh-嵌入式膜

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摘要

In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Omega sq(-1). In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20 000 cycles of bending tests.
机译:在本作工作中,我们开发了一种使用模板辅助Ni电沉积和热转印过程制造用于透明导电电极的Ni Nanmeshes的新方法。 通过采用直接印刷氢倍半硅氧烷(HSQ),将微尺寸的HSQ模板成功转移到不锈钢基板上。 使用选择性Ni电沉积和聚碳酸酯(PC)膜上的热转移方法制造Ni Nanomesh。 Ni-NanoMesh-嵌入式PC膜的PC膜的透射率的约77%和2-10ωSq(-1)的薄层电阻。 另外,在弯曲试验的20 000次循环后,Ni-nanmesh嵌入式PC膜的透射率和薄层电阻不会显着降解。

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  • 来源
    《RSC Advances》 |2016年第85期|共4页
  • 作者单位

    Korea Univ Dept Mat Sci &

    Engn Anam Ro 145 Seoul 02841 South Korea;

    Korea Univ Dept Mat Sci &

    Engn Anam Ro 145 Seoul 02841 South Korea;

    Korea Univ Dept Mat Sci &

    Engn Anam Ro 145 Seoul 02841 South Korea;

    Korea Univ Dept Mat Sci &

    Engn Anam Ro 145 Seoul 02841 South Korea;

    Korea Univ Dept Mat Sci &

    Engn Anam Ro 145 Seoul 02841 South Korea;

    Korea Univ Dept Mat Sci &

    Engn Anam Ro 145 Seoul 02841 South Korea;

    Korea Univ Dept Mat Sci &

    Engn Anam Ro 145 Seoul 02841 South Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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