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Electrochemical deposition of Fe2O3 in the presence of organic additives: a route to enhanced photoactivity

机译:Fe2O3在有机添加剂存在下的电化学沉积:一种增强光度的途径

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摘要

The photoelectrochemical activity of hematite films prepared by electrochemical deposition (ED) in the presence of organic additives is discussed. The studies focus on the role of small organic additive molecules in the tuning of the morphology of the films and their influence on the photoelectrochemical oxidation of water. The organic additives, namely, coumarin 343 (C343), gamma-glucuronic acid (GA) and sodium dodecyl sulfonate (Sds), possess functional moieties to interact with iron ions in the ED bath electrostatically or through metal-ligand complexation reactions. XPS measurements prove that the organic additives are incorporated, and the oxidation state of Fe3+ rules out the presence of mixed valences in the films. SEM and XRD measurements present morphological and structural evidence, respectively. The photoelectrochemical study shows that organically modified hematite films exhibit enhanced photoactivity; the photocurrent density at 1.4 V vs. RHE on a GA-modified electrode is up to 5-6 times higher than on the unmodified electrode. Electrochemical impedance results reveal the role of the organic additives in reducing the charge transfer resistance from the hematite surface to the solution. In addition, a simple Ti post treatment greatly enhances the photoactivity of all electrodes under investigation.
机译:讨论了通过电化学沉积(ED)在有机添加剂存在下制备的赤铁矿膜的光电化学活性。研究重点是小型有机添加剂分子在调整薄膜形态的调整及其对水的影响的作用。有机添加剂,即香豆素343(C343),γ-葡糖醛酸(Ga)和十二烷基磺酸钠(SDS),具有功能性部分,以静电地或通过金属 - 配体络合反应与Ed浴中的铁离子相互作用。 XPS测量证明了有机添加剂掺入,并且Fe3 +的氧化状态排出薄膜中的混合级的存在。 SEM和XRD测量分别存在形态和结构证据。光电化学研究表明,有机改性的赤铁矿膜表现出增强的光脱离; Ga-Demified电极上1.4V与Rhe的光电流密度高于未改性电极上的5-6倍。电化学阻抗结果揭示了有机添加剂在将来自赤铁矿表面的电荷转移性降低到溶液中的作用。此外,简单的TI后处理大大提高了所有电极的拍摄。

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  • 来源
    《RSC Advances》 |2015年第125期|共11页
  • 作者单位

    Carl von Ossietzky Univ Oldenburg Inst Chem Tech Chem D-26129 Oldenburg Germany;

    Ruhr Univ Bochum Lab Ind Chem Fac Chem &

    Biochem D-44801 Bochum Germany;

    Carl von Ossietzky Univ Oldenburg Inst Chem Tech Chem D-26129 Oldenburg Germany;

    Ruhr Univ Bochum Lab Ind Chem Fac Chem &

    Biochem D-44801 Bochum Germany;

    Leibniz Univ Hannover Inst Tech Chem D-30167 Hannover Germany;

    Carl von Ossietzky Univ Oldenburg Inst Chem Tech Chem D-26129 Oldenburg Germany;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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