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Controllable boron doping of carbon nanotubes with tunable dopant functionalities: an effective strategy toward carbon materials with enhanced electrical properties

机译:可调谐掺杂功能的可控硼掺杂碳纳米管:具有增强电性能的碳材料的有效策略

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摘要

We present a two-step postgrowth substitution reaction route to produce boron-doped carbon nanotubes (BCNTs) with controllable B dopant concentration and uniform B atom distribution under atmospheric pressure. The unique two-step postgrowth substitution reaction route comprised a simple wet-chemistry-assisted pretreatment and an atmospheric-pressure carbothermic reaction. Extensive materials characterizations confirmed that BCNTs with uniform B dopant distribution and controllable B atomic concentration from 0.40 to 3.92 atomic percent (atom%) can be produced by controlling the reaction time and temperature under atmospheric pressure in the developed method. The film-based electrical sheet resistance measurement indicates that the averaged electrical sheet resistances of the as-fabricated CNT-based films can be improved from 1520 +/- 197.56 to 43.67 +/- 12.63 Omega per square with 2.09 atom% B concentration in the doped CNTs. High-resolution X-ray photoelectron spectroscopy (HRXPS) characterization suggests that the B-C-O bonding types and concentrations in the asproduced BCNTs may play an important role in the nanotube electrical properties. Our study provides a methodology to tailor the material properties of carbon-based materials.
机译:我们介绍了一种两步的生成后取代反应途径,以在大气压下生产具有可控的B掺杂剂浓度和均匀的B原子分布的硼掺杂的碳纳米管(BCNT)。独特的两步后期取代反应途径包括简单的湿化学辅助预处理和大气压碳热反应。广泛的材料表征证实,具有均匀B掺杂剂分布和可控B原子浓度为0.40至3.92原子百分比(原子%)的BCNT通过在发育方法中的大气压下的反应时间和温度来制备。基于薄膜的电薄层电阻测量表明,可以从1520 +/- 197.56到43.67 +/- 12.56〜43.67 +/- 12.63ω/正方形的平均电薄膜电阻。在2.09原子%b浓度掺杂的CNT。高分辨率X射线光电子体光谱(HRXPS)表征表明,B-C-O键合类型和助剂中的BCNT中的浓度可在纳米管电性能中发挥重要作用。我们的研究提供了一种根据碳基材料的材料特性提供方法。

著录项

  • 来源
    《RSC Advances》 |2015年第118期|共10页
  • 作者单位

    Natl Taiwan Univ Sci &

    Technol Dept Chem Engn Taipei 10607 Taiwan;

    Natl Taiwan Univ Sci &

    Technol Dept Chem Engn Taipei 10607 Taiwan;

    Ind Technol Res Inst Mat &

    Chem Res Labs Hsinchu 30013 Taiwan;

    Ind Technol Res Inst Mat &

    Chem Res Labs Hsinchu 30013 Taiwan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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