High-quality epitaxy of ruthenium dioxide, RuO_2, on rutile titanium dioxide, TiO2, by pulsed chemical vapor deposition

Wang X.; Gordon R.G.

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High-quality epitaxy of ruthenium dioxide, RuO_2, on rutile titanium dioxide, TiO2, by pulsed chemical vapor deposition

机译：通过脉冲化学气相沉积法在金红石型二氧化钛TiO2上对二氧化钌RuO_2进行高质量外延

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Pulsed chemical vapor deposition was used to prepare epitaxial ruthenium dioxide (RuO_2) film on rutile TiO_2 (011) at low temperature 280 °C. Reciprocal space mapping by high-resolution X-ray diffraction was used to examine the quality of epitaxy, which demonstrated a high quality epitaxy of the deposited RuO_2 film. The results also showed that the RuO_2 lattice was fully strained by the substrate in the lateral directions and, therefore, distorted from a tetragonal to a monoclinic structure.

机译：采用脉冲化学气相沉积法在低温280°C的金红石型TiO_2（011）上制备外延二氧化钌（RuO_2）薄膜。通过高分辨率X射线衍射进行的倒数空间映射用于检查外延的质量，这表明沉积的RuO_2薄膜具有高质量的外延。结果还表明，RuO_2晶格在横向方向上被基底完全拉紧，因此从四方结构变形为单斜结构。

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《Crystal growth & design》 |2013年第3期|共6页
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Wang X.; Gordon R.G.;
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中图分类晶体学;
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1. High-quality epitaxy of ruthenium dioxide, RuO_2, on rutile titanium dioxide, TiO2, by pulsed chemical vapor deposition [J] . Wang X., Gordon R.G. Crystal growth & design . 2013,第3期

机译：通过脉冲化学气相沉积法在金红石型二氧化钛TiO2上对二氧化钌RuO_2进行高质量外延
2. Evolution of titanium dioxide one-dimensional nanostructures from surface-reaction-limited pulsed chemical vapor deposition [J] . Xudong Wang, Jian Shi Journal of Materials Research . 2013,第3期

机译：由表面反应受限的脉冲化学气相沉积法演化的二氧化钛一维纳米结构
3. Epitaxial growth of ruthenium dioxide films by chemical vapor deposition and its comparison with similarly grown chromium dioxide films [J] . Miao GX, Gupta A, Xiao G, Thin Solid Films . 2005,第1a2期

机译：化学气相沉积法外延生长二氧化钌薄膜及其与相似生长的二氧化铬薄膜的比较
4. Pulsed-Chemical vapor deposition of Ruthenium and Ruthenium dioxide thin films Using RuO_4 precursor for the DRAM capacitor electrode [C] . Jeong Hwan Han, Sang Woon Lee, Gyu Jin Choi, International symposium on silicon nitride, silicon dioxide, and emerging dielectrics;Meeting of the Electrochemical Society . 2009

机译：使用RuO_4前驱体作为DRAM电容器电极的钌和二氧化钌薄膜的脉冲化学气相沉积
5. Metalorganic chemical vapor deposition and characterization of titanium dioxide nanoparticles. [D] . Li, Weidong. 2004

机译：二氧化钛纳米粒子的金属有机化学气相沉积和表征。
6. High Temperature Stable Anatase Phase Titanium Dioxide Films Synthesized by Mist Chemical Vapor Deposition [O] . Qiang Zhang, Chaoyang Li 2020

机译：雾化学气相沉积合成高温稳定锐钛矿相二氧化钛薄膜
7. Reactive pulsed laser ablation deposition (RPLAD) of indium tin oxide (ITO), titanium dioxide (TiO2) thin films and gold (AU) nanoparticles for dye sensitised solar cells (DSSC) applications [O] . Fotsa-Ngaffo Fernande 2008

机译：铟锡氧化物（ITO），二氧化钛（TiO2）薄膜和金（AU）纳米粒子的反应性脉冲激光烧蚀沉积（RPLAD），用于染料敏化太阳能电池（DSSC）应用

High-quality epitaxy of ruthenium dioxide, RuO_2, on rutile titanium dioxide, TiO2, by pulsed chemical vapor deposition

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