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首页> 外文期刊>Crystal growth & design >Microwave plasma nitridation of SrTiO_3: A quantitative EELS, TEM, and STEM-HAADF analysis of the SrTiO_(3-x)N_y growth and the structural evolution
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Microwave plasma nitridation of SrTiO_3: A quantitative EELS, TEM, and STEM-HAADF analysis of the SrTiO_(3-x)N_y growth and the structural evolution

机译:SrTiO_3的微波等离子体氮化:SrTiO_(3-x)N_y生长和结构演变的定量EELS,TEM和STEM-HAADF分析

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The structural and microstructural evolution of microwave plasma nitrided SrTiO_3 was studied by scanning, high-resolution transmission electron microscopy (STEM, HRTEM), electron energy loss spectroscopy, and energy dispersion X-ray spectroscopy (EELS/EDX) combined with elemental mapping at the nanometer scale. EELS/EDX mappings show the SrTiO_(3-x)N_y single crystal formation as well as the TiN_(1-x)O_y nanograin layer formation on the surface, which depends on the plasma treatments. Stacking faults were the most common defects found in single crystal SrTiO _(3-x)N_y, either with SrO plane-excess or TiO_2 plane-excess. The excess of SrO was integrated as Ruddlesden-Popper planar faults, showing an arrangement of the three-dimensional nanostructure, and the excess of TiO_(2-x)N_y was integrated as crystallographic shear defects. Nitrogen incorporation into the structure is not homogeneous at the atomic level, and a high concentration of nitrogen was found in Sr-deficient planar defects.
机译:通过扫描,高分辨率透射电子显微镜(STEM,HRTEM),电子能量损失光谱和能量色散X射线光谱(EELS / EDX)结合元素图谱研究了微波等离子体氮化SrTiO_3的结构和微观结构演变。纳米级。 EELS / EDX映射显示SrTiO_(3-x)N_y单晶形成以及表面上TiN_(1-x)O_y纳米晶粒层的形成,这取决于等离子体处理。堆垛层错是单晶SrTiO _(3-x)N_y中最常见的缺陷,SrO平面过量或TiO_2平面过量。过量的SrO被整合为Ruddlesden-Popper平面断层,显示了三维纳米结构的排列,而过量的TiO_(2-x)N_y被整合为晶体学剪切缺陷。氮结合到结构中在原子水平上是不均匀的,并且在缺乏Sr的平面缺陷中发现了高浓度的氮。

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