...
首页> 外文期刊>Crystal growth & design >Growth Mode Transition in Complex Oxide Heteroepitaxy: Atomically Resolved Studies
【24h】

Growth Mode Transition in Complex Oxide Heteroepitaxy: Atomically Resolved Studies

机译:复杂氧化物异外延生长模式的转变:原子分辨的研究。

获取原文
获取原文并翻译 | 示例
           

摘要

We performed investigations of the atomic-scale surface structure of epitaxial La5/8Ca3/8MnO3 thin films as a model system dependent on growth conditions in pulsed laser deposition with emphasis on film growth kinetics. Postdeposition in situ scanning tunneling microscopy was combined with in operando reflective high-energy electron diffraction to monitor the film growth and ex situ. X-ray diffraction for structural analysis. We find a correlation between the out-of-plane lattice parameter and both adspecies mobility and height of the Ehrlich Schwoebel barrier, with mobility of adatoms greater over the cationically stoichiometric terminations. The data suggest that the out-of-plane lattice parameter is dependent on the mechanism of epitaxial strain relaxation, which is controlled by the oxidative power of the deposition environment.
机译:我们对外延La5 / 8Ca3 / 8MnO3薄膜的原子尺度表面结构进行了研究,该模型是依赖于脉冲激光沉积中生长条件的模型系统,重点是薄膜生长动力学。沉积后原位扫描隧道显微镜与在操作中反射高能电子衍射相结合,以监测薄膜的生长和非原位。用于结构分析的X射线衍射。我们发现,平面外晶格参数与Ehrlich Schwoebel势垒的固有迁移率和高度之间存在相关性,在阳离子化学计量末端上,原子的迁移率更大。数据表明,面外晶格参数取决于外延应变松弛机制,该机制由沉积环境的氧化能力控制。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号