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首页> 外文期刊>Crystal growth & design >Polycrystalline Cu_7Te_4 dendritic microstructures constructed by spherical nanoparticles: Fast electrodeposition, influencing factors, and the shape evolution
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Polycrystalline Cu_7Te_4 dendritic microstructures constructed by spherical nanoparticles: Fast electrodeposition, influencing factors, and the shape evolution

机译：球形纳米粒子构成的多晶Cu_7Te_4树枝状微结构：快速电沉积，影响因素和形状演变

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摘要

Polycrystalline Cu_7Te_4 dendritic microstructures were successfully synthesized via a simple galvanostatic electrochemical deposition method at room temperature, employing a mixed solution containing Cu(CH _3COO)_2, Na_2TeO_3, and nitric acid as the electrolyte. Cu_7Te_4 dendrites were deposited at the current of 16 mA for 5 min. The phase and morphology of the as-prepared product were characterized by means of powder X-ray diffraction (XRD), energy-dispersive spectrometry (EDS), (high-resolution) transmission electron microscopy (HR/TEM), and scanning electron microscopy (SEM). Some factors influencing the formation of dendritic Cu_7Te_4 microstructures were systematically investigated, including the depositing currents, complexants, surfactants, original amounts of Cu(CH_3COO)_2, and Cu ~(2+) ion sources. Experiments showed that the low deposition current and the concentration of Cu(CH_3COO)_2 were unfavorable for the formation of dendritic Cu_7Te_4 microstructures constructed by nanoparticles. A time-dependent shape evolution of polycrystalline Cu_7Te_4 dendrites was studied.
机译：采用含Cu（CH _3COO）_2，Na_2TeO_3和硝酸的混合溶液作为电解质，通过简单的恒电流电化学沉积方法在室温下成功合成了多晶Cu_7Te_4树枝状微结构。以16 mA的电流沉积Cu_7Te_4树突5分钟。通过粉末X射线衍射（XRD），能量色散谱（EDS），（高分辨率）透射电子显微镜（HR / TEM）和扫描电子显微镜对所制备产品的相和形态进行表征。 （SEM）。系统地研究了影响树枝状Cu_7Te_4微结构形成的因素，包括沉积电流，络合剂，表面活性剂，Cu（CH_3COO）_2的原始量和Cu〜（2+）离子源。实验表明，低沉积电流和低浓度的Cu（CH_3COO）_2不利于纳米粒子形成的树枝状Cu_7Te_4微观结构的形成。研究了随时间变化的多晶Cu_7Te_4枝晶的形状演变。

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