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Growth of rutile titanium dioxide nanowires by pulsed chemical vapor deposition

机译:通过脉冲化学气相沉积法生长金红石型二氧化钛纳米线

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摘要

Recently, we developed a surface reaction-limited pulsed chemical vapor deposition (CVD) technique that can grow highly uniform anatase TiO_2 nanorods (NRs) over a large area, even inside highly confined submicrometer-sized spaces. Here, we report the growth of rutile TiO_2 NWs using this technique by introducing a Au seeding layer at higher deposition temperature, where a small amount of anatase phase was also found. A bifurcated growth of rutile TiO_2 NWs was observed. The resulting TiO _2 NWs exhibited high-quality crystallinity and large surface areas with exposure of high-index surfaces. Control experiments illustrated the influence of deposition conditions on the TiO_2 growth behavior. Higher deposition temperature could convert the TiO_2 phase from anatase to rutile. A thin film of Au was able to induce rapid crystal growth resulting in particle formation, while the anisotropic NW growth preferred no Au coating. Shorter purging time could significantly enhance the deposition rate because of the incomplete removal of precursor molecules. This research enriched our knowledge of the surface reaction-limited pulsed CVD technique and demonstrated the capability of using this technique to control the TiO _2 phase and morphology.
机译:最近,我们开发了一种表面反应受限的脉冲化学气相沉积(CVD)技术,即使在高度受限的亚微米大小的空间内,也可以在大面积上生长高度均匀的锐钛矿型TiO_2纳米棒(NRs)。在这里,我们报道了通过在较高的沉积温度下引入金(Au)种子层(其中还发现了少量的锐钛矿相)而使用该技术生长的金红石型TiO_2 NWs。观察到金红石型TiO_2 NWs分叉生长。所得的TiO _2 NWs表现出高质量的结晶度,并具有高折射率表面暴露的大表面积。对照实验说明了沉积条件对TiO_2生长行为的影响。较高的沉积温度可将TiO_2相从锐钛型转变为金红石型。 Au的薄膜能够引起晶体的快速生长,从而导致颗粒的形成,而各向异性的NW生长优选没有Au涂层。由于未完全清除前体分子,较短的吹扫时间可以显着提高沉积速率。这项研究丰富了我们对表面反应受限的脉冲CVD技术的了解,并展示了使用该技术控制TiO _2相和形貌的能力。

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