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首页> 外文期刊>ACS Macro Letters >Substrate-Dependent Physical Aging of Confined Nafion Thin Films
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Substrate-Dependent Physical Aging of Confined Nafion Thin Films

机译：基底依赖于狭窄的Nafion薄膜的物理老化

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摘要

The humidity-induced physical aging, or structural relaxation, of spin-cast Nafion thin films on gold, carbon, and native oxide silicon (n-SiO2) substrates was examined using spectroscopic ellipsometry (SE). Physical aging rates, beta, were calculated from the change in measured sample thickness, h, upon exposure to controlled humidity. Three Nafion films, h = 188, 57, and 27 nm, deposited on gold substrates demonstrated an increased beta with decreasing thickness due to confinement. The Nafion film on n-SiO2, h = 165 nm, also showed a humidity-induced aging, while a Nafion film deposited on carbon, h = 190 nm, exhibited no measurable humidity-induced aging. The reported rate of aging was related to the strength of the polymer/substrate interactions during film formation. Strong interactions between Nafion and the gold and n-SiO2 substrates anchored the thin film to the substrate during film formation, resulting in a nonequilibrium as-cast film and subsequent relaxation upon exposure to water vapor until complete plasticization. Weak interactions between the carbon substrate and Nafion resulted in fully relaxed as-cast films which displayed no relaxation upon hydration.
机译：使用光谱椭圆形测量（SE）检查金，碳和天然氧化物硅（N-SiO 2）衬底上的湿度诱导的旋转的Nafion薄膜的物理老化或结构松弛。在暴露于受控湿度时，从测量样品厚度H的变化计算出物理老化率β。沉积在金基质上的三个裸膜H = 188,57和27nm，表现出增加的β由于禁闭而降低厚度。 N-SiO2，H = 165nm的Nafion膜还显示出湿度诱导的老化，而沉积在碳上的Nafion薄膜H = 190nm，则没有可测量的湿度诱导的老化。报告的老化率与聚合物/底物相互作用在膜形成过程中的强度有关。在薄膜形成期间，Nafion和金和N-SiO 2基板之间的强相互作用将薄膜固定到基板上，导致在暴露于水蒸汽直至完全塑化时随后松弛。碳基材和Nafion之间的弱相互作用导致完全松弛的薄膜，其在水合时没有放松。

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