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首页> 外文期刊>Electroanalysis >Electrochemical Studies on Self-assembled Monolayer (SAM) Upon Exposure to Anionic Surfactants: PFOA, PFOS, SDS and SDBS
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Electrochemical Studies on Self-assembled Monolayer (SAM) Upon Exposure to Anionic Surfactants: PFOA, PFOS, SDS and SDBS

机译:在暴露于阴离子表面活性剂时自组装单层(SAM)的电化学研究:PFOA,PFOS,SDS和SDBS

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摘要

We investigate the interaction between anionic surfactants (AS) and a self-assembled monolayer (SAM) using cyclic voltammetry (CV), electrochemical impedance spectrum (EIS) and electrochemical quartz crystal microbalance (EQCM). The AS include two common fluorosurfactants, which have been previously formulated in aqueous film-forming foam (AFFF): perfluorooctanoic acid (PFOA), perfluorooctanesulfonic acid (PFOS), and two common detergents: sodium dodecyl sulphate (SDS) and sodium dodecyl benzenesulfonate (SDBS). The AS can re-configure the SAM arrangement, particularly on nanoporous gold surface due to the high density of defects and pinholes of SAM, which results in changes to the electrochemical redox kinetics and interface capacitance of the SAM. Based on the experimental results, we hypothesis that AS insert and dope the pristine monolayer, which is evidenced with EQCM and EIS.
机译:我们研究了使用循环伏安法(CV),电化学阻抗谱(EIS)和电化学石英晶微观(EQCM)之间的阴离子表面活性剂(AS)和自组装单层(SAM)之间的相互作用。 该具有两种常见的含氟表面活性剂,其先前已在含水成膜泡沫(AFFF):全氟辛酸(PFOA),全氟辛磺酸(PFOS)和两种常见洗涤剂:十二烷基硫酸钠(SDS)和十二烷基苯磺酸钠( SDBS)。 由于SAM的缺陷和针孔的高密度,可以重新配置SAM布置,特别是在纳米多孔金表面上,这导致山姆的电化学氧化还原动力学和扫描件的界面电容导致山姆。 基于实验结果,我们假设作为插入和涂料的原始单层,这被EQCM和EIS所证明。

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