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首页> 外文期刊>Crystallography reports >Low-Temperature Molecular Beam Epitaxy of GaAs: Influence of Crystallization Conditions on Structure and Properties of Layers
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Low-Temperature Molecular Beam Epitaxy of GaAs: Influence of Crystallization Conditions on Structure and Properties of Layers

机译:GaAs的低温分子束外延:结晶条件对层结构和性能的影响

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摘要

A nontraditional approach to the control of GaAs properties via the introduction of an excessive amount of arsenic during growth of epitaxial layers under conditions of low-temperature molecular-beam epitaxy (LT-GaAs layers) is considered. The influence of excessive arsenic on the structure and properties of asgrown and annealed LT-GaAs layers is considered as well as the effect of layer doping on the "capture" of excess arsenic.
机译:考虑了在低温分子束外延(LT-GaAs层)的条件下通过在外延层的生长期间引入过量的砷来控制GaAs性质的非传统方法。考虑了过量砷对已生长和退火的LT-GaAs层的结构和性能的影响,以及层掺杂对过量砷“捕获”的影响。

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