Investigation of the thermal diffusion during the formation of a quasicrystalline phase in thin Al-Pd-Re films

Seregin A.Yu.; Makhotkin I.A.; Yakunin S.N.; Erko A.I.; Tereshchenko E.Yu.; Shaitura D.S.; Chikina E.A.; Tsetlin M.B.; Mikheeva M.N.; OlShanskii E.D.

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Investigation of the thermal diffusion during the formation of a quasicrystalline phase in thin Al-Pd-Re films

机译：Al-Pd-Re薄膜中准晶相形成过程中的热扩散研究

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The layer mixing during the formation of the Al_(70)Pd _(20)Re_(10) icosahedral quasicrystalline phase in thin (55 nm) Al-Pd-Re layered film systems subjected to vacuum annealing has been studied. It is shown that a combined layer of Pd and Al atoms (with the Al _3Pd_2 phase dominating) is formed in the first stage (at 350°C), while the rhenium layer remains invariable. In the second annealing stage (at 450°C), the β′-AlPd phase is formed and the Re layer is diffused. In the third stage (700°C), Pd and Re atoms are uniformly distributed throughout the film with the formation of a quasicrystalline phase.

机译：研究了在薄的（55 nm）Al-Pd-Re分层薄膜系统中进行真空退火的Al_（70）Pd _（20）Re_（10）二十面体准晶相形成过程中的层混合。结果表明，在第一阶段（350℃）形成了Pd和Al原子的结合层（以Al _3Pd_2相为主），而layer层保持不变。在第二退火阶段（在450℃下），形成β′-AlPd相，并扩散Re层。在第三阶段（700℃），Pd和Re原子均匀地分布在整个薄膜中，并形成准晶相。

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《Crystallography reports》 |2011年第3期|共5页
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Seregin A.Yu.; Makhotkin I.A.; Yakunin S.N.; Erko A.I.; Tereshchenko E.Yu.; Shaitura D.S.; Chikina E.A.; Tsetlin M.B.; Mikheeva M.N.; OlShanskii E.D.;
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中图分类晶体学;
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Investigation of the thermal diffusion during the formation of a quasicrystalline phase in thin Al-Pd-Re films

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