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Photocatalytic degradation of triclosan by oxygen defected CuO thin film

机译:氧气缺氧CuO薄膜的光催化降解Triclosan

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CuO thin films with oxygen defects (oxygen vacancy and oxygen excess) were prepared by sputter deposition from stochiometric CuO target. Presence of Oxygen defects was confirmed by X-ray photoelectron spectroscopy. Effect of oxygen vacancy and excess on the photocatalytic activity (Triclosan (TS) degradation) of CuO thin films under sunlight irradiation was investigated. Generation of oxygen vacancy (lower than optimum concentration) and excess considerably improved the thin film photocatalytic activity. In original work, the photocatalytic activity of the samples with oxygen vacancy was compared to the ones with oxygen excess. Moreover, the durability of the samples (oxygen vacancy and excess) after several cycles was investigated. The samples with oxygen excess showed better photocatalytic activity; though, the durability of samples with oxygen vacancy was significantly superior to the ones with oxygen excess after 5 cycles.
机译:通过溅射沉积从小学计量组合靶制备具有氧缺陷(氧气空位和氧过量)的CuO薄膜。 通过X射线光电子体光谱证实了氧缺陷的存在。 阳光照射下CuO薄膜的光催化活性对光催化活性(Triclosan(Ts)降解)的影响。 产生氧气空位(低于最佳浓度),并且过量改善薄膜光催化活性。 在原始工作中,将样品的光催化活性与氧空位的样品相比,与氧气过量的相比。 此外,研究了在几个循环后的样品(氧气空位和过量)的耐久性。 氧气过量的样品显示出更好的光催化活性; 然而,氧气空位的耐久性明显优于5个循环后过量的氧空位。

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