Comparison of three types of redox active polymer for two photon stereolithography

Folkertsma Laura; Zhang Kaihuan; Hempenius Mark A.; Vancso G. Julius; van den Berg Albert; Odijk Mathieu

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Comparison of three types of redox active polymer for two photon stereolithography

机译：两种光子立体光刻三种类型的氧化还原活性聚合物的比较

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Three-dimensional printing and stereolithography of functional materials for nanofabrication have recently generated a big amount of interest, as have responsive materials. We have investigated the applicability of the redox-responsive polymer poly(ferrocenylsilane) (PFS) for stereolithography purposes. Three types of PFS were synthesized, each functionalized with specific properties to make them interesting for use in nanofabrication. These properties include various stiffness, crosslink densities and hydrophobicities. One of the three PFSs is polycationic, therefore resulting in a hydrogel structure. We show structures fabricated from these materials. Common challenges in using new materials such as these for two-photon stereolithography are discussed. (C) 2017 The Authors Polymers for Advanced Technologies Published by John Wiley & Sons Ltd

机译：纳米制备功能材料的三维印刷和立体刻度最近产生了大量的兴趣，具有响应性材料。我们研究了氧化还原响应聚合物聚（二氧化苯基硅烷）（PFS）对立体光刻目的的适用性。合成了三种类型的PFS，每个PFS具有特定性质，使其有趣地用于纳米制作。这些性质包括各种刚度，交联密度和疏水性。三种PFSS中的一种是聚合的，因此导致水凝胶结构。我们展示了由这些材料制造的结构。讨论了使用新材料的共同挑战，例如这些用于双光子立体化立体刻度。（c）2017年John Wiley＆Sons Ltd出版的先进技术的作者聚合物

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来源
《Polymers for advanced technologies》 |2017年第9期|共4页
作者
Folkertsma Laura; Zhang Kaihuan; Hempenius Mark A.; Vancso G. Julius; van den Berg Albert; Odijk Mathieu;
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作者单位

Univ Twente MIRA Inst Biomed Engn &

Tech Med MESA Inst Nanotechnol BIOS Lab On A Chip Grp Enschede Netherlands;

Univ Twente MESA Inst Nanotechnol MTP Enschede Netherlands;

Univ Twente MESA Inst Nanotechnol MTP Enschede Netherlands;

Univ Twente MESA Inst Nanotechnol MTP Enschede Netherlands;

Univ Twente MIRA Inst Biomed Engn &

Tech Med MESA Inst Nanotechnol BIOS Lab On A Chip Grp Enschede Netherlands;

Univ Twente MIRA Inst Biomed Engn &

Tech Med MESA Inst Nanotechnol BIOS Lab On A Chip Grp Enschede Netherlands;

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正文语种 eng
中图分类高分子化合物工业（高聚物工业）;
关键词
poly(ferrocenylsilane); 3D-printing; nanolithography; two-photon stereolithography; polycation;

机译：聚（二氧烷基硅烷）;3D印刷;纳米光刻;双光子立体刻度;泛粘合剂;

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专利

1. Comparison of three types of redox active polymer for two photon stereolithography [J] . Folkertsma Laura, Zhang Kaihuan, Hempenius Mark A., Polymers for advanced technologies . 2017,第9期

机译：两种光子立体光刻三种类型的氧化还原活性聚合物的比较
2. Emerging N-Type Redox-Active Radical Polymer for a Totally Organic Polymer-Based Rechargeable Battery [J] . Takeo Suga, Hiroki Ohshiro, Shuhei Sugita, Advanced Materials . 2009,第16期

机译：用于完全基于有机聚合物的可充电电池的新兴N型氧化还原活性自由基聚合物
3. Redox-Active Porous Coordination Polymers Prepared by Trinuclear Heterometallic Pivalate Linking with the Redox-Active Nickel(II) Complex: Synthesis, Structure, Magnetic and Redox Properties, and Electrocatalytic Activity in Organic Compound Dehalogenation in Heterogeneous Medium [J] . A. S. Lytvynenko, S. V. Kolotilov, M. A. Kiskin, Inorganic Chemistry: A Research Journal that Includes Bioinorganic, Catalytic, Organometallic, Solid-State, and Synthetic Chemistry and Reaction Dynamics . 2014,第10期

机译：三核新金属新戊酸酯与氧化还原活性镍（II）配合物连接制备的氧化还原活性多孔配位聚合物：非均相介质中有机化合物脱卤的合成，结构，磁性和氧化还原性质以及电催化活性
4. Magnetically active polymeric nanocomposites for two-photon stereolithography [C] . Guerrieri S., Qualtieri A., Quarta A., IEEE International Conference on Nanotechnology . 2014

机译：用于双光子立体光刻的磁性活性聚合物纳米复合材料
5. Nitrate Reduction by Low-Valent Chromium Complexes Enhanced by Redox-Active Bis(Pyrazolyl)Pyridine Pincer Type Ligand [D] . Seo, Jung Hee 2018

机译：氧化还原活性双（吡唑基）吡啶钳型配体增强的低价铬配合物的硝酸盐还原作用
6. Additive Manufactured Polymer-Bonded Isotropic NdFeB Magnets by Stereolithography and Their Comparison to Fused Filament Fabricated and Selective Laser Sintered Magnets [O] . Christian Huber, Gerald Mitteramskogler, Michael Goertler, 2020

机译：立体光刻法增材制造的聚合物粘结的各向同性钕铁硼磁体及其与熔丝制造和选择性激光烧结磁体的比较
7. Comparison of three types of redox active polymer for two photon stereolithography [O] . Folkertsma-Hendriks, Laura, Zhang, Kaihuan, Hempenius, Mark A., 2017

机译：两种光子立体光刻中三种类型的氧化还原活性聚合物的比较
8. Well-Defined Redox-Active Polymers and Block Copolymers Prepared by Living Ring-Opening Metathesis Polymerization [R] . Albagli, D., Bazan, G., Wrighton, M. S., 1992

机译：通过活性开环易位聚合制备的定义明确的氧化还原活性聚合物和嵌段共聚物

Comparison of three types of redox active polymer for two photon stereolithography

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