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Corrosion behaviour of as deposited and PMMA treated TiN coating systems deposited by cathodic arc technique

机译:阴极电弧技术沉积的和经PMMA处理的TiN涂层系统的腐蚀行为

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摘要

Vapour deposited coatings usually contain microscopic defects, which can provide corrosive media with easy access to the substrate. Consequently, formation of galvanic cells between the coating and substrate can initiate localised corrosion at the defective sites. In this study, TiN coatings were deposited on mild steel (MS) and stainless steel (SS) substrates using a cathodic arc technique. A post-deposition treatment with polymethyl methacrylate (PMMA) was applied to both TiN/MS and TiN/SS systems to block access of corrosion media to the substrates through the coating defects. The as deposited and PMMA treated coating systems were subjected to electrochemical tests in 3.5%NaCl solution. Potentiodynamic polarisation testing results indicated that the PMMA treatment led to a higher corrosion potential and a lower anodic current density for both TiN/MS and TiN/SS systems when compared with their as deposited counterparts. Extended exposure in 3.5%NaCl caused severe localised corrosion in the as deposited TiN/MS due to the presence of coating defects and poor corrosion resistance of the substrate. Electrochemical impedance spectroscopic measurements demonstrated that the PMMA post-deposition treatment significantly improved corrosion resistance of both TiN/MS and TiN/SS systems by effectively sealing the open voids or pores associated with the coating defects.
机译:汽相沉积的涂层通常包含微观缺陷,可以提供腐蚀性介质且易于接近基材。因此,在涂层和基材之间形成原电池可以在缺陷部位引发局部腐蚀。在这项研究中,使用阴极电弧技术将TiN涂层沉积在低碳钢(MS)和不锈钢(SS)基材上。 TiN / MS和TiN / SS系统均采用聚甲基丙烯酸甲酯(PMMA)进行后沉积处理,以阻止腐蚀介质通过涂层缺陷进入基材。将沉积的和经PMMA处理的涂料体系在3.5%NaCl溶液中进行电化学测试。电位动力极化测试结果表明,与沉积的PMMA相比,PMMA处理导致TiN / MS和TiN / SS系统的腐蚀电位更高,阳极电流密度更低。由于存在涂层缺陷和基材的耐腐蚀性差,在3.5%NaCl中长时间暴露会导致TiN / MS沉积时发生严重的局部腐蚀。电化学阻抗谱测量表明,PMMA沉积后处理可通过有效密封与涂层缺陷相关的开口或孔洞,显着提高TiN / MS和TiN / SS系统的耐腐蚀性。

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