Studying the Composition and Phase State of Thin PZT Films Obtained by High-Frequency Magnetron Sputtering under Variation of Working Gas Pressure

Dolgintsev D. M.; Pronin V. P.; Kaptelov E. Yu.; Senkevich S. V.; Pronin I. P.

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Studying the Composition and Phase State of Thin PZT Films Obtained by High-Frequency Magnetron Sputtering under Variation of Working Gas Pressure

机译：在工作气体压力变化下的高频磁控溅射获得的薄PZT薄膜的组成和相位状态

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Variation of the working gas pressure (from 8 to 2 Pa) during RF magnetron sputtering deposition of thin perovskite lead zirconate titanate (PZT) films revealed strong changes in their lead content, which decreased below the stoichiometric level and led to the formation of a two-phase (perovskite-pyrochlore) structure upon subsequent high-temperature annealing. Measurements of the composition of perovskite islands in the two-phase films showed that the lead content in these islands was equal to or greater than stoichiometric. These results lead to the conclusion that the obtained PZT films are free of lead vacancies.

机译：在薄钙钛矿锆型钛酸钛酸盐（PZT）膜的RF磁控溅射沉积期间的工作气体压力（从8至2 PA）揭示其铅含量的强烈变化，降低了化学计量水平，并导致形成两种 - 在随后的高温退火时 - 相位（钙钛矿 - 纤维）结构。两相膜中Perovskite岛的组成的测量表明，这些岛中的铅含量等于或大于化学计量。这些结果导致所获得的PZT薄膜没有引线空位。

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《Technical physics letters: Letters to the Russian journal of applied physics》 |2019年第3期|共4页
作者
Dolgintsev D. M.; Pronin V. P.; Kaptelov E. Yu.; Senkevich S. V.; Pronin I. P.;
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Herzen State Pedag Univ Russia St Petersburg 191186 Russia;

Herzen State Pedag Univ Russia St Petersburg 191186 Russia;

Herzen State Pedag Univ Russia St Petersburg 191186 Russia;

Herzen State Pedag Univ Russia St Petersburg 191186 Russia;

Herzen State Pedag Univ Russia St Petersburg 191186 Russia;

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正文语种 eng
中图分类工程物理学;物理学;
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1. Studying the Composition and Phase State of Thin PZT Films Obtained by High-Frequency Magnetron Sputtering under Variation of Working Gas Pressure [J] . Dolgintsev D. M., Pronin V. P., Kaptelov E. Yu., Technical physics letters: Letters to the Russian journal of applied physics . 2019,第3期

机译：在工作气体压力变化下的高频磁控溅射获得的薄PZT薄膜的组成和相位状态
2. Compositional and structural analysis of RF magnetron sputtered La{sup}(3+)-modified PZT thin films [J] . Ravindra Singh, B. R. Chakraborty, Nahar Singh, Journal of Materials Processing Technology . 2009,第2期

机译：射频磁控溅射La {sup}（3+）修饰的PZT薄膜的组成和结构分析
3. Combined in-depth X-ray Photoelectron Spectroscopy and Time-of-Flight Secondary Ion Mass Spectroscopy study of the effect of deposition pressure and substrate bias on the electrical properties and composition of Ga-doped ZnO thin films grown by magnetron sputtering [J] . Correia Filipe C., Ribeiro Joana M., Salvador Paulo B., Thin Solid Films . 2018,第NOVa1期

机译：结合深度X射线光电子能谱和飞行时间二次离子质谱研究沉积压力和衬底偏压对磁控溅射生长的Ga掺杂ZnO薄膜的电性能和组成的影响
4. Deposition of AlN Thin Film by High-Power Impulse Magnetron Sputtering with Tilted Sputter Target at Different Working Pressure [C] . Zulkifli Bin Azman, Nafarizal Bin Nayan, Ahmad Shuhaimi Bin Abu Bakar, IEEE Student Conference on Research and Development . 2020

机译：倾斜靶在不同工作压力下大功率脉冲磁控溅射沉积AlN薄膜
5. Effect of plasma energy, plasma power, working distance, and inert gas pressure on composition of sputtered thermoelastic titanium-nickel thin films. [D] . Lee, Jiun-Chung. 1994

机译：等离子体能量，等离子体功率，工作距离和惰性气体压力对溅射热弹性钛镍薄膜组成的影响。
6. Structural Compositional and Plasmonic Characteristics of Ti–Zr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering [O] . Lianlian Chen, Yujing Ran, Zhaotan Jiang, 2020

机译：通过磁控溅射中氮流量的氮气流量调节的Ti-Zr三元氮化物薄膜的结构组成和等离子体特性
7. Investigation of the Properties of Al-doped ZnO Thin Films with Sputtering Pressure Deposition by RF Magnetron Sputtering [O] . Weiqiang Shuai, Yuehui Hu, Yichuan Chen, 2017

机译：RF磁控溅射溅射压力沉积抗氮锌薄膜性能研究

Studying the Composition and Phase State of Thin PZT Films Obtained by High-Frequency Magnetron Sputtering under Variation of Working Gas Pressure

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